SCHEMBL384204

SCHEMBL384204

O=c1c2ccc(Cl)cc2[nH]c2cc(O)cc(O)c12

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ EGFR P00533 1/20 0.48
▸ SRC P12931 1/20 0.48
▸ GRIN2D O15399 2/20 0.48
▸ GRIN3B O60391 2/20 0.48
▸ GRIN1 Q05586 2/20 0.48
▸ GRIN2A Q12879 2/20 0.48
▸ GRIN2B Q13224 2/20 0.48
▸ GRIN2C Q14957 2/20 0.48
▸ GRIN3A Q8TCU5 2/20 0.48
▸ PARP1 P09874 1/20 0.45
▸ CA12 O43570 1/20 0.44
▸ CA9 Q16790 1/20 0.44
▸ TP53 P04637 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ MEN1 O00255 2/20 0.44
▸ KMT2A Q03164 2/20 0.44
▸ ALDH1A1 P00352 1/20 0.44
▸ CYP1A2 P05177 1/20 0.44
▸ CYP3A4 P08684 1/20 0.44
▸ CYP2D6 P10635 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28065372 0.88 EGFR (0.48) EGFRSRCGRIN2DGRIN3BGRIN1
SCHEMBL3609835 0.82 GRIN2D (0.54) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL382594 0.80 GAA (0.58) SMN1; SMN2MEN1KMT2AALDH1A1LMNA
SCHEMBL14543827 0.78 PARP1 (0.62) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL5836912 0.76 NQO1 (0.46) EGFRSRCGRIN2DGRIN3BGRIN1
SCHEMBL12015108 0.75 PARP1 (0.58) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL11532887 0.75 PARP1 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL29586144 0.75 PARP1 (0.58) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL16852336 0.74 PBRM1 (0.49) EGFRSRCKDM4EDAO
SCHEMBL14543826 0.72 PARP1 (0.59) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112239623-B Polymer for display device 罗门哈斯电子材料有限责任公司 2022-10-04 — — CN claimed
CN-112239623-A Polymer for display device 罗门哈斯电子材料有限责任公司 2021-01-19 — — CN claimed
US-20100317653-A1 OXADIAZOLE DERIVATIVES AS DGAT INHIBITORS ASTRAZENECA AB (SE) 2010-12-16 — — US claimed
US-20080096874-A1 Oxadiazole Derivative as Dgat Inhibitors ASTRAZENECA AB (SE) 2008-04-24 — — US claimed
EP-1833806-A1 OXADIAZOLE DERIVATIVES AS DGAT INHIBITORS AstraZeneca AB (SE) 2007-09-19 — — EP claimed
WO-2006064189-A1 OXADIAZOLE DERIVATIVES AS DGAT INHIBITORS ASTRAZENECA AB (SE) 2006-06-22 — — WO claimed
EP-1004568-B1 Novel ester compounds, polymers, resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2006-01-25 — — EP claimed
US-6596463-B2 Photosensitivity, resolution, chemical resistance SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2003-07-22 — — US claimed
US-6312867-B1 Ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-06 — — US claimed
CN-118240154-A Curable composition and film made therefrom 罗门哈斯电子材料韩国有限公司 2024-06-25 — — CN disclosed
CN-118240153-A Curable composition and film made therefrom 罗门哈斯电子材料韩国有限公司 2024-06-25 — — CN disclosed
CN-112239623-B Polymer for display device 罗门哈斯电子材料有限责任公司 2022-10-04 — — CN disclosed
CN-112239623-A Polymer for display device 罗门哈斯电子材料有限责任公司 2021-01-19 — — CN disclosed
EP-2482132-B1 Resist pattern forming process SHINETSU CHEMICAL CO (JP) 2019-10-16 — — EP disclosed
EP-1085377-A1 Resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-03-21 — — EP disclosed
EP-1053985-A1 Resist compositions and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2000-11-22 — — EP disclosed
US-6146806-A Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same NEC CORPORATION (JP) 2000-11-14 — — US disclosed
US-6147249-A ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-11-14 — — US disclosed
EP-1031879-A1 Novel ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-30 — — EP disclosed
EP-1004568-A2 Novel ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-05-31 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100317653-A1 OXADIAZOLE DERIVATIVES AS DGAT INHIBITORS DGAT1, DGAT2, GPR119 EGFR 2999/4885SRC 2473/4885GRIN2D 542/4885
US-20080096874-A1 Oxadiazole Derivative as Dgat Inhibitors DGAT1, DGAT2, GPR119 EGFR 2901/4885SRC 2878/4885GRIN2D 542/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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