Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | CYP24A1 | Q07973 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | VDR | P11473 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | STAT3 | P40763 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | BCHE | P06276 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10880135 | 0.86 | VDR (0.38) | CA12CA1CA9MEN1KMT2A | |
| SCHEMBL2759913 | 0.82 | LOX (0.40) | MEN1KMT2ASMN1; SMN2ALDH1A1GAA | |
| SCHEMBL9339661 | 0.82 | TSHR (0.38) | MEN1KMT2ACYP2C19HTTSMN1; SMN2 | |
| SCHEMBL13242117 | 0.79 | CA12 (0.41) | CA12CA1CA9KMT2AVDR | |
| SCHEMBL21167279 | 0.78 | DRD2 (0.44) | CYP2C19SMN1; SMN2ALDH1A1 | |
| SCHEMBL15083001 | 0.78 | SOAT1 (0.38) | MEN1KMT2ACYP2C19HTTSMN1; SMN2 | |
| SCHEMBL13231836 | 0.77 | ALDH1A1 (0.43) | CA12CA1CA9HTTSMN1; SMN2 | |
| SCHEMBL14838299 | 0.75 | FABP4 (0.36) | MEN1KMT2ACYP2C19HTTSMN1; SMN2 | |
| SCHEMBL6059650 | 0.75 | CA12 (0.39) | CA12CA1CA9KMT2ACYP2C19 | |
| SCHEMBL15082991 | 0.74 | FABP3 (0.35) | ALDH1A1BCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 303 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5919601-A | COMPRISING THERMAL-ACTIVATED ACID GENERATOR, CROSSLINKING RESIN, BINDER RESIN CONTAINING PENDANT GROUPS CAPABLE OF UNDERGOING ACID-CATALYZED CONDENSATION WITH CROSSLINKING RESIN, INFRARED ABSORBER | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-07-06 | — | — | US | claimed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| EP-3309614-B1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL CORP (JP) | 2021-11-10 | — | — | EP | disclosed |
| US-10649337-B2 | Positive type lithographic printing plate precursor, method of producing same, and method of preparing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2020-05-12 | — | — | US | disclosed |
| US-10564545-B2 | Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2020-02-18 | — | — | US | disclosed |
| US-10437149-B2 | Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound | FUJIFILM CORPORATION (JP) | 2019-10-08 | — | — | US | disclosed |
| US-10363733-B2 | Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound | FUJIFILM CORPORATION (JP) | 2019-07-30 | — | — | US | disclosed |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| EP-1015244-B1 | PROCESSLESS, LASER IMAGEABLE LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS CO (US) | 2002-03-13 | — | — | EP | disclosed |
| US-6261740-B1 | Processless, laser imageable lithographic printing plate | KODAK POLYCHROME GRAPHICS, LLC | 2001-07-17 | — | — | US | disclosed |
| EP-1029668-A2 | Processless, laser imageable lithographic printing plate | Kodak Polychrome Graphics Company Ltd. (US) | 2000-08-23 | — | — | EP | disclosed |
| EP-1015244-A1 | PROCESSLESS, LASER IMAGEABLE LITHOGRAPHIC PRINTING PLATE | Kodak Polychrome Graphics (US) | 2000-07-05 | — | — | EP | disclosed |
| EP-0938413-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES | Kodak Polychrome Graphics (US) | 1999-09-01 | — | — | EP | disclosed |
| US-5919601-A | COMPRISING THERMAL-ACTIVATED ACID GENERATOR, CROSSLINKING RESIN, BINDER RESIN CONTAINING PENDANT GROUPS CAPABLE OF UNDERGOING ACID-CATALYZED CONDENSATION WITH CROSSLINKING RESIN, INFRARED ABSORBER | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-07-06 | — | — | US | disclosed |
| WO-1999011457-A1 | PROCESSLESS, LASER IMAGEABLE LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-03-11 | — | — | WO | disclosed |
| WO-1998021038-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES | KODAK POLYCHROME GRAPHICS (US) | 1998-05-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | CA12 3278/4885CA1 2755/4885CA9 1898/4885 |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | ABL1, PI4K2B, FES | CA12 4002/4885CA1 3582/4885CA9 1775/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | CA12 2739/4885CA1 3683/4885CA9 3570/4885 |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | PNN, PI4K2B, PI4K2A | CA12 4301/4885CA1 4203/4885CA9 2443/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.