Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.50 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.50 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.46 |
| ▸ | GPR84 | Q9NQS5 | 4/20 | 0.42 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.42 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.42 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.42 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | PPARG | P37231 | 5/20 | 0.41 |
| ▸ | PPARD | Q03181 | 5/20 | 0.41 |
| ▸ | PPARA | Q07869 | 5/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 4/20 | 0.41 |
| ▸ | TLR2 | O60603 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29846701 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL29846461 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL29845816 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL29846446 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL2282017 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL2282740 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL2286965 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL29846283 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL2285994 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 | |
| SCHEMBL2280479 | 0.98 | ALDH1A1 (0.56) | LMNAALDH1A1TSHRNFKB1PMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7994273-B2 | Photoactive materials | ROLIC AG (CH) | 2011-08-09 | — | — | US | claimed |
| US-7750185-B2 | Photoactive materials | ROLIC AG (CH) | 2010-07-06 | — | — | US | claimed |
| EP-1150166-B1 | Polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-12-19 | — | — | EP | claimed |
| EP-1732924-A2 | TETRAHYDRONAPHTHYRIDINE DERIVATIVES AS CHOLESTERYL ESTER TRANSFER PROTEIN INHIBITORS | TANABE SEIYAKU CO., LTD. (JP) | 2006-12-20 | — | — | EP | claimed |
| US-20050288480-A1 | Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked | ROLIC AG (CH) | 2005-12-29 | — | — | US | claimed |
| WO-2005095395-A2 | TETRAHYDRONAPHTHYRIDINE DERIVATIVES AS CHOLESTERYL ESTER TRANSFER PROTEIN INHIBITORS | TANABE SEIYAKU CO., LTD. (JP) | 2005-10-13 | — | — | WO | claimed |
| EP-1386910-A1 | Photoactive materials | Rolic AG (CH) | 2004-02-04 | — | — | EP | claimed |
| US-6667145-B1 | Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-6566038-B2 | Micropatterning using electron beams or ultraviolet rays | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-20 | — | — | US | claimed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| US-11780961-B2 | Organic metal-free catalysts with electrophilic and nucleophilic dual-functions, preparation methods of making the same, and uses thereof | ZHEJIANG UNIVERSITY (CN) | 2023-10-10 | — | — | US | disclosed |
| US-20220259379-A1 | COPOLYAMIDES OBTAINABLE FROM 4-(AMINOMETHYL)BENZOIC ACID | SOLVAY SPECIALITY POLYMERS USA, LLC | 2022-08-18 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-10034824-B2 | Hair shaping composition | CONOPCO, INC. (US) | 2018-07-31 | — | — | US | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| EP-0705834-A1 | Quinoxaline-2,3-diones with an azaheterocyclic fused ring | CIBA-GEIGY AG (CH) | 1996-04-10 | — | — | EP | disclosed |
| EP-0705835-A1 | Quinoxalic-2,3-diones with an oxa or thiaheterocyclic fused ring | CIBA-GEIGY AG (CH) | 1996-04-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10034824-B2 | Hair shaping composition | MATR3, HAMP, FNIP1 | LMNA 2406/4885ALDH1A1 1194/4885TSHR 2919/4885 |
| US-20050288480-A1 | Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked | C9, F12, DAO | LMNA 581/4885ALDH1A1 1929/4885TSHR 4654/4885 |
| US-11780961-B2 | Organic metal-free catalysts with electrophilic and nucleophilic dual-functions, preparation methods of making the same, and uses thereof | DUOX1, SOD1, DUOX2 | LMNA 4262/4885ALDH1A1 424/4885TSHR 4669/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.