SCHEMBL3851487

SCHEMBL3851487

[CH2]C=C(c1c(C)cc(C)cc1C)c1c(C)cc(C)cc1C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.35
ALDH1A1 P00352 3/20 0.34
LMNA P02545 3/20 0.34
MAPT P10636 2/20 0.34
KDM4E B2RXH2 2/20 0.34
GAA P10253 1/20 0.34
KMT2A Q03164 3/20 0.33
MAPK1 P28482 1/20 0.33
TAS1R3 Q7RTX0 2/20 0.32
TAS1R1 Q7RTX1 2/20 0.32
TAS1R2 Q8TE23 2/20 0.32
TP53 P04637 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
HPGD P15428 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MEN1 O00255 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
MCOLN3 Q8TDD5 1/20 0.32
CA1 P00915 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3844699 0.82 KMT2A (0.38) ALDH1A1LMNAMAPTKMT2AL3MBTL1
SCHEMBL3844702 0.82 KMT2A (0.38) ALDH1A1LMNAMAPTKMT2AL3MBTL1
SCHEMBL10604733 0.79 RAPGEF4 (0.38) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL4630818 0.71 LMNA (0.33) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL7527264 0.70 RAPGEF4 (0.39) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL2848308 0.69 RAPGEF4 (0.43) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL12726829 0.69 KMT2A (0.41) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL1109757 0.69 RAPGEF4 (0.38) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL918994 0.67 RAPGEF4 (0.41) RAPGEF4ALDH1A1LMNAMAPTKDM4E
SCHEMBL2722808 0.67 RAPGEF4 (0.41) RAPGEF4ALDH1A1LMNAMAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2116527-A1 OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR PRODUCTION OF THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT FUJIFILM Corporation (JP) 2009-11-11 EP disclosed
US-20030129504-A1 Photosensitive resin compositon, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof FUJI PHOTO FILM CO., LTD. 2003-07-10 US disclosed