⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12697178 | 0.77 | — | — | |
| SCHEMBL4873078 | 0.77 | — | — | |
| SCHEMBL108164 | 0.74 | ATM (0.42) | — | |
| SCHEMBL19322850 | 0.74 | ATM (0.42) | — | |
| SCHEMBL14410627 | 0.74 | ATM (0.42) | — | |
| SCHEMBL14448183 | 0.74 | ATM (0.42) | — | |
| SCHEMBL5929449 | 0.72 | PTGS2 (0.33) | — | |
| SCHEMBL4834444 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL4831836 | 0.71 | — | — | |
| SCHEMBL2382893 | 0.70 | VDR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7582412-B2 | Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-7390608-B2 | Photoresists containing Si-polymers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-06-24 | — | — | US | disclosed |
| US-7306892-B2 | Multilayer photoresist system | SHIPLEY COMPANY, L.L.C. (US) | 2007-12-11 | — | — | US | disclosed |
| EP-1319197-B1 | ANTIREFLECTIVE COMPOSITION | SHIPLEY CO LLC (US) | 2007-06-06 | — | — | EP | disclosed |
| US-7217490-B2 | Processes for producing silane monomers and polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2007-05-15 | — | — | US | disclosed |
| US-7118847-B2 | Polymer and photoresist compositions | SHIPLEY COMPANY LLC (US) | 2006-10-10 | — | — | US | disclosed |
| US-7008750-B2 | Processes for producing polysiloxanes and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-03-07 | — | — | US | disclosed |
| US-20050170278-A1 | Polymer and photoresist compositions | SZMANDA CHARLES R (US) | 2005-08-04 | — | — | US | disclosed |
| EP-1127900-B1 | Polymer and photoresist compositions | SHIPLEY CO LLC (US) | 2005-04-27 | — | — | EP | disclosed |
| US-20050026077-A1 | Forming relief images; for ((opto)electronics; photoresists; mixture of binder and photoactivable compound | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-03 | — | — | US | disclosed |
| US-20020160302-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-10-31 | — | — | US | disclosed |
| US-20020155380-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2002-10-24 | — | — | US | disclosed |
| US-20020119391-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-08-29 | — | — | US | disclosed |
| US-20020076642-A1 | Antireflective composition | SHIPLEY COMPANY, L.L.C. | 2002-06-20 | — | — | US | disclosed |
| US-6406828-B1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2002-06-18 | — | — | US | disclosed |
| US-20020051928-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-02 | — | — | US | disclosed |
| US-20020004570-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-01-10 | — | — | US | disclosed |
| EP-1130468-A2 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-09-05 | — | — | EP | disclosed |
| EP-1127900-A1 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |
| EP-1127899-A1 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |