Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 3/20 | 0.32 |
| ▸ | HPGD | P15428 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | XBP1 | P17861 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | F2 | P00734 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | XPO1 | O14980 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64157 | 0.75 | ALDH1A1 (0.61) | VDRKMT2AKDM4EMAPTHPGD | |
| SCHEMBL29368754 | 0.75 | ALDH1A1 (0.61) | VDRKMT2AKDM4EMAPTHPGD | |
| SCHEMBL3853587 | 0.75 | KDM4E (0.30) | KDM4ELMNA | |
| SCHEMBL21561249 | 0.73 | KDM4E (0.35) | VDRKMT2AKDM4EMAPTHPGD | |
| SCHEMBL111659 | 0.73 | DRD2 (0.31) | — | |
| SCHEMBL3855033 | 0.73 | — | — | |
| SCHEMBL4873078 | 0.73 | — | — | |
| SCHEMBL14707486 | 0.73 | VDR (0.36) | VDRKMT2AKDM4EMAPTHPGD | |
| SCHEMBL3855464 | 0.72 | KDM4E (0.43) | VDRKMT2AKDM4EMAPTHPGD | |
| SCHEMBL4831836 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1158363-B1 | Positive resist composition and onium salts of saccharin derivatives | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-8026037-B2 | Si-polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-27 | — | — | US | disclosed |
| US-7582412-B2 | Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-20090136867-A1 | Si-polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-05-28 | — | — | US | disclosed |
| US-20090045552-A1 | Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same | IMAI GENJI | 2009-02-19 | — | — | US | disclosed |
| US-7390609-B2 | have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoresists that comprise such polymers; component of resists imaged at short wavelengths | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-06-24 | — | — | US | disclosed |
| US-7390608-B2 | Photoresists containing Si-polymers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-06-24 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-20020160302-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-10-31 | — | — | US | disclosed |
| US-20020155380-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2002-10-24 | — | — | US | disclosed |
| US-20020119391-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-08-29 | — | — | US | disclosed |
| US-20020076642-A1 | Antireflective composition | SHIPLEY COMPANY, L.L.C. | 2002-06-20 | — | — | US | disclosed |
| US-6406828-B1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2002-06-18 | — | — | US | disclosed |
| US-20020051928-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-02 | — | — | US | disclosed |
| US-20020004570-A1 | Polymer and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-01-10 | — | — | US | disclosed |
| EP-1130468-A2 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-09-05 | — | — | EP | disclosed |
| EP-1127899-A1 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |
| EP-1127900-A1 | Polymer and photoresist compositions | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |