SCHEMBL3858084

SCHEMBL3858084

C=CC(=O)OC1C2CC3CC(C2)CC1(C#N)C3

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL454651 0.78 THRB (0.30)
SCHEMBL7036978 0.77
SCHEMBL284285 0.77
SCHEMBL3953939 0.76 THRB (0.32)
SCHEMBL30185994 0.76
SCHEMBL19619432 0.76
SCHEMBL451377 0.73 ALDH1A1 (0.31)
SCHEMBL5907604 0.72
SCHEMBL7185948 0.71
SCHEMBL21247654 0.71 MEN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592125-B2 Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises hydroxy naphthyl groups and a second cross-linked resin; reduced line edge roughness ROHM AND HAAS ELECTRIC MATERIALS LLC (US) 2009-09-22 US disclosed
EP-1684120-A1 Photresist compositions comprising resin blends Rohm and Haas Electronic Materials LLC (US) 2006-07-26 EP disclosed
US-20060160022-A1 Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises carbocyclic aryl units with hetero substitution and a second cross-linked resin ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-07-20 US disclosed