Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3871913 | 0.89 | ALDH1A1 (0.34) | ALDH1A1MAPTNPSR1THRBCNR2 | |
| SCHEMBL4887218 | 0.79 | PKM (0.46) | ALDH1A1MAPTNPSR1THRBLMNA | |
| SCHEMBL14641099 | 0.79 | PGR (0.32) | CNR2 | |
| SCHEMBL4098563 | 0.79 | ALDH1A1 (0.35) | ALDH1A1MAPTNPSR1THRBLMNA | |
| SCHEMBL3435247 | 0.74 | TSHR (0.37) | NPSR1CNR2LMNA | |
| SCHEMBL16290409 | 0.74 | PKM (0.47) | ALDH1A1 | |
| SCHEMBL678337 | 0.71 | HSD11B1 (0.49) | ALDH1A1NPSR1THRBCNR2SMN1; SMN2 | |
| SCHEMBL12104275 | 0.70 | PKM (0.42) | ALDH1A1MAPTNPSR1THRBLMNA | |
| SCHEMBL12104242 | 0.70 | NPSR1 (0.40) | ALDH1A1MAPTNPSR1THRBLMNA | |
| SCHEMBL4034053 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1708728-B | Radiation-sensitive resin composition | JSR CORP | 2011-03-16 | — | — | CN | disclosed |
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| CN-101533224-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2009-09-16 | — | — | CN | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| CN-1708728-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-12-14 | — | — | CN | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |