SCHEMBL3872277

SCHEMBL3872277

CC1(C)CC(COC(=O)C2CC3C=CC2C3)OC1=O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.44
POLB P06746 3/20 0.40
HSD17B10 Q99714 2/20 0.40
APEX1 P27695 1/20 0.40
RECQL P46063 1/20 0.40
BLM P54132 1/20 0.40
ESR2 Q92731 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HPGD P15428 1/20 0.40
KMT2A Q03164 3/20 0.40
RAB9A P51151 1/20 0.39
KDM4E B2RXH2 2/20 0.38
MEN1 O00255 1/20 0.38
ALOX15 P16050 1/20 0.38
TSHR P16473 1/20 0.38
HTT P42858 1/20 0.38
MAPK1 P28482 2/20 0.37
LMNA P02545 2/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3872267 0.77 POLB (0.42) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL4911491 0.76 TP53 (0.54) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL3873465 0.76 ALDH1A1 (0.40) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL22654022 0.76 CA2 (0.41) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL6830364 0.71 TP53 (0.44) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL2481141 0.71 ALDH1A1 (0.43) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL24255312 0.70 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL417020 0.70 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL19708550 0.70 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL598148 0.70 ALDH1A1 (0.44) ALDH1A1POLBHSD17B10APEX1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed