SCHEMBL3874587

SCHEMBL3874587

O=C(OC12CC3CC(CC(O)(C3)C1)C2)C1CC2C=CC1C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.39
ALDH1A1 P00352 6/20 0.34
KMT2A Q03164 2/20 0.33
RAB9A P51151 1/20 0.33
EPHX2 P34913 2/20 0.33
POLB P06746 2/20 0.32
APEX1 P27695 1/20 0.32
RECQL P46063 1/20 0.32
BLM P54132 1/20 0.32
ESR2 Q92731 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HPGD P15428 1/20 0.32
PKM P14618 1/20 0.32
HSD11B1 P28845 1/20 0.31
DPP8 Q6V1X1 1/20 0.31
DPP9 Q86TI2 1/20 0.31
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1415384 0.86 KDM4E (0.45) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL23187879 0.72 POLB (0.36) ALDH1A1POLBL3MBTL1HPGDPKM
SCHEMBL11908810 0.72 ALDH1A1 (0.47) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL2776167 0.72 LMNA (0.57) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL14378676 0.72 LMNA (0.57) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL14428682 0.71 PKM (0.33) ALDH1A1PKMHSD11B1DPP8DPP9
SCHEMBL11908877 0.71 ALDH1A1 (0.44) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL3881579 0.71 KDM4E (0.37) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL524854 0.70 KDM4E (0.41) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL23187878 0.70 KDM4E (0.41) KDM4ELMNAALDH1A1KMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116500858-A Coating of combined photoresist and Si-based hard mask 上海艾深斯科技有限公司 2023-07-28 CN claimed
CN-116500858-A Coating of combined photoresist and Si-based hard mask 上海艾深斯科技有限公司 2023-07-28 CN disclosed
CN-111699206-B Polymers comprising photoacid generators 株式会社LG化学 2022-05-10 CN disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed