SCHEMBL3890072

SCHEMBL3890072

CCOCCCC[SiH](OC(C)=O)OC(C)=O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
TSHR P16473 2/20 0.45
CES2 O00748 2/20 0.37
THRB P10828 1/20 0.36
KMT2A Q03164 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
EPHX2 P34913 1/20 0.32
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
HPGD P15428 2/20 0.31
HTT P42858 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
TP53 P04637 1/20 0.31
GAA P10253 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3894115 0.87 CES2 (0.40) ALDH1A1TSHRCES2THRBKMT2A
SCHEMBL3898094 0.80 ALDH1A1 (0.42) ALDH1A1TSHREPHX2
SCHEMBL11492778 0.79 ALDH1A1 (0.43) ALDH1A1TSHRCES2KMT2AHSD17B10
SCHEMBL18496521 0.78 ALDH1A1 (0.41) ALDH1A1TSHRCES2KMT2AHSD17B10
SCHEMBL18496519 0.78 ALDH1A1 (0.41) ALDH1A1TSHRCES2KMT2AHSD17B10
SCHEMBL704158 0.77 ALDH1A1 (0.44) ALDH1A1TSHRCES2LMNAHSD17B10
SCHEMBL3889133 0.77 ALDH1A1 (0.36) ALDH1A1TSHRTHRBHPGDHTT
SCHEMBL3447665 0.75 TSHR (0.55) ALDH1A1TSHRTP53SMN1; SMN2
SCHEMBL7633546 0.74 PAOX (0.41) ALDH1A1TSHRTHRBKMT2ALMNA
SCHEMBL5832458 0.73 TSHR (0.56) ALDH1A1TSHRTHRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed