Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3890834 | 0.87 | NAAA (0.37) | ALDH1A1TSHRNAAATHRBHTT | |
| SCHEMBL712068 | 0.83 | NAAA (0.37) | ALDH1A1NAAAHTT | |
| SCHEMBL705062 | 0.83 | ALDH1A1 (0.40) | ALDH1A1NAAAHTT | |
| SCHEMBL3901993 | 0.82 | ALDH1A1 (0.36) | ALDH1A1TSHRNAAAHTT | |
| SCHEMBL7758883 | 0.79 | ALDH1A1 (0.50) | ALDH1A1TSHRNAAAHTTRAB9A | |
| SCHEMBL704203 | 0.79 | ALDH1A1 (0.38) | ALDH1A1NAAAHPGDSMN1; SMN2 | |
| SCHEMBL3896443 | 0.79 | TDP1 (0.30) | — | |
| SCHEMBL3893538 | 0.77 | LPAR1 (0.39) | ALDH1A1 | |
| SCHEMBL3890072 | 0.77 | ALDH1A1 (0.45) | ALDH1A1TSHRTHRBHPGDHTT | |
| SCHEMBL7979936 | 0.76 | NAAA (0.32) | ALDH1A1TSHRNAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | claimed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |