SCHEMBL3901993

SCHEMBL3901993

CCC(=O)O[SiH](CCCOC)OC(=O)CC

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
NAAA Q02083 1/20 0.35
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.30
EPHX2 P34913 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705062 0.85 ALDH1A1 (0.40) ALDH1A1NAAAHTT
SCHEMBL712068 0.85 NAAA (0.37) ALDH1A1NAAAHTT
SCHEMBL3889133 0.82 ALDH1A1 (0.36) ALDH1A1NAAATSHRHTT
SCHEMBL7758883 0.81 ALDH1A1 (0.50) ALDH1A1NAAATSHRHTT
SCHEMBL3890834 0.81 NAAA (0.37) ALDH1A1NAAATSHRHTTEPHX2
SCHEMBL704203 0.80 ALDH1A1 (0.38) ALDH1A1NAAARECQL
SCHEMBL3893538 0.79 LPAR1 (0.39) ALDH1A1
SCHEMBL7057740 0.78 NAAA (0.50) ALDH1A1NAAATSHR
SCHEMBL7979936 0.78 NAAA (0.32) ALDH1A1NAAATSHR
SCHEMBL3896443 0.77 TDP1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed