SCHEMBL3909040

SCHEMBL3909040

CC=C(C)C(N=C=O)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.37
LMNA P02545 3/20 0.35
MAPK1 P28482 1/20 0.35
MIF P14174 3/20 0.35
ADRA2A P08913 1/20 0.33
ADRA2C P18825 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
NOS2 P35228 1/20 0.33
HIF1A Q16665 1/20 0.33
KDM4E B2RXH2 1/20 0.33
TRPA1 O75762 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16192842 0.80 MIF (0.36) HPGDLMNAMAPK1MIFADRA2A
SCHEMBL988808 0.80 HPGD (0.42) HPGDLMNAMIFADRA2AADRA2C
SCHEMBL3578270 0.77 SRC (0.46) LMNAMAPK1
SCHEMBL8627633 0.77 SRC (0.46) LMNAMAPK1
Styrene SCHEMBL6536411 0.74 ALDH1A1 (0.41) HPGDLMNAADRA2AADRA2CNPC1
SCHEMBL8853888 0.74 KMT2A (0.55) LMNAMAPK1ALDH1A1
SCHEMBL29036003 0.74 KMT2A (0.55) LMNAMAPK1ALDH1A1
SCHEMBL43325 0.72 SRC (0.42) LMNAMAPK1MIFALDH1A1
SCHEMBL1563451 0.71 TRPA1 (0.36) HPGDLMNAMAPK1MIFNOS2
SCHEMBL3519342 0.69 MIF (0.36) MIF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556911-B2 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method FUJIFILM CORPORATION (JP) 2009-07-07 US disclosed
CN-101142525-A Pattern formation material, pattern formation device, and pattern formation method FUJI FILM CORP (JP) 2008-03-12 CN disclosed
CN-101124516-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI FILM CORP (JP) 2008-02-13 CN disclosed
US-20070212642-A1 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
WO-2005083522-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-09-09 WO disclosed