Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.57 |
| ▸ | MEN1 | O00255 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.57 |
| ▸ | CA5A | P35218 | 2/20 | 0.36 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.36 |
| ▸ | BBOX1 | O75936 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | NT5E | P21589 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | CA6 | P23280 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL15348713 | 0.96 | MEN1 (0.53) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL36962 | 0.96 | TSHR (0.61) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL8460208 | 0.92 | TSHR (0.57) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL28051064 | 0.92 | TSHR (0.57) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL28468866 | 0.86 | TSHR (0.50) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL27655670 | 0.84 | CA5A (0.55) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL3909243 | 0.84 | BBOX1 (0.36) | TSHRMEN1ALDH1A1KMT2ABBOX1 | |
| Sulfuric Acid SCHEMBL11797353 | 0.81 | TSHR (0.53) | TSHRMEN1ALDH1A1KMT2ACA5A | |
| Tetramethylammonium Ion SCHEMBL16714019 | 0.80 | BBOX1 (0.35) | TSHRMEN1ALDH1A1KMT2ABBOX1 | |
| Tetramethylammonium Ion SCHEMBL36961 | 0.79 | CHRNB2 (0.40) | TSHRMEN1ALDH1A1KMT2ABBOX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7497966-B2 | Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor | HANWHA CHEMICAL CORPORATION (KR) | 2009-03-03 | — | — | US | claimed |
| WO-2008023858-A1 | MANUFACTURING METHODS OF FINE CERIUM OXIDE PARTICLES AND ITS SLURRY FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR | HANWHA CHEMICAL CORPORATION (KR) | 2008-02-28 | — | — | WO | claimed |
| US-20070220813-A1 | Chemical Mechanical Polishing Slurry Composition for Shallow Trench Isolation Process of Semiconductor | HANWHA CHEMICAL CORPORATION (KR) | 2007-09-27 | — | — | US | claimed |
| WO-2006004258-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR | HANWHA CHEMICAL CORPORATION (KR) | 2006-01-12 | — | — | WO | claimed |
| CN-119789748-A | Perovskite precursor solution, perovskite solar cell and preparation method | 天合光能股份有限公司 | 2025-04-08 | — | — | CN | disclosed |
| US-20220018826-A1 | COLORIMETRIC PLASMONIC NANOSENSOR FOR DOSIMETRY OF THERAPEUTIC LEVELS OF IONIZING RADIATION | ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (US) | 2022-01-20 | — | — | US | disclosed |
| US-10428160-B2 | Colorimetric hydrogel based nanosensor for detection of therapeutic levels of ionizing radiation | ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (US) | 2019-10-01 | — | — | US | disclosed |
| US-20180066074-A1 | Colorimetric Hydrogel Based Nanosensor for Detection of Therapeutic Levels of Ionizing Radiation | BANNER HEALTH - AN ARIZONA NONPROFIT CORPORATION | 2018-03-08 | — | — | US | disclosed |
| US-9869027-B2 | Cleaning composition and method of manufacturing metal wiring using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-01-16 | — | — | US | disclosed |
| US-20170212037-A1 | COLORIMETRIC PLASMONIC NANOSENSOR FOR DOSIMETRY OF THERAPEUTIC LEVELS OF IONIZING RADIATION | BANNER HEALTH, AN ARIZONA NONPROFIT CORPORATION | 2017-07-27 | — | — | US | disclosed |
| US-20160230289-A1 | CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME | SAMSUNG DISPLAY CO LTD (KR) | 2016-08-11 | — | — | US | disclosed |
| US-9340759-B2 | Cleaning composition and method of manufacturing metal wiring using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-05-17 | — | — | US | disclosed |
| US-20150136728-A1 | CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-05-21 | — | — | US | disclosed |
| US-7497966-B2 | Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor | HANWHA CHEMICAL CORPORATION (KR) | 2009-03-03 | — | — | US | disclosed |
| WO-2008023858-A1 | MANUFACTURING METHODS OF FINE CERIUM OXIDE PARTICLES AND ITS SLURRY FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR | HANWHA CHEMICAL CORPORATION (KR) | 2008-02-28 | — | — | WO | disclosed |
| US-20070220813-A1 | Chemical Mechanical Polishing Slurry Composition for Shallow Trench Isolation Process of Semiconductor | HANWHA CHEMICAL CORPORATION (KR) | 2007-09-27 | — | — | US | disclosed |
| WO-2006004258-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR | HANWHA CHEMICAL CORPORATION (KR) | 2006-01-12 | — | — | WO | disclosed |