SCHEMBL3913348

SCHEMBL3913348

COOCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.47
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
GRIN2D O15399 4/20 0.42
GRIN3B O60391 4/20 0.42
GRIN1 Q05586 4/20 0.42
GRIN2A Q12879 4/20 0.42
GRIN2B Q13224 4/20 0.42
GRIN2C Q14957 4/20 0.42
GRIN3A Q8TCU5 4/20 0.42
HSD17B10 Q99714 1/20 0.38
TSHR P16473 1/20 0.38
NPSR1 Q6W5P4 1/20 0.36
EPHX2 P34913 1/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL197070 0.80 GRIN2D (0.48) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL5095244 0.74 GRIN2D (0.50) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL13094610 0.73 CA12 (0.41) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL92293 0.71 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL5467820 0.71 CA12 (0.40) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL1714716 0.70 GRIN2D (0.52) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL20612578 0.70 CA12 (0.47) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL197069 0.70 CA12 (0.47) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL775356 0.70 CA12 (0.39) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL104842 0.70 CA12 (0.42) ALDH1A1MEN1KMT2AL3MBTL1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7507522-B2 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers E. I. DUPONT DE NEMOURS AND COMPANY (US) 2009-03-24 US disclosed
US-20070207413-A1 Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers DUPONT ELECTRONICS, INC. 2007-09-06 US disclosed
WO-2005118656-A2 PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS E.I. DUPONT DE NEMOURS AND COMPANY (US) 2005-12-15 WO disclosed