Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.37 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.37 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.37 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.37 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.37 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.37 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.34 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | GBA2 | Q9HCG7 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14094017 | 0.82 | CA12 (0.38) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL2739871 | 0.82 | LMNA (0.46) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL104842 | 0.81 | CA12 (0.42) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL24110766 | 0.78 | ALDH1A1 (0.38) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL11911870 | 0.78 | CA12 (0.40) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL10075596 | 0.78 | CA12 (0.44) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL11950508 | 0.78 | CA12 (0.40) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL14461665 | 0.77 | CA12 (0.37) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL10051156 | 0.77 | ALDH1A1 (0.44) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL13924702 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20210063875-A1 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-9791776-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-17 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-7338755-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070224550-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224550-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224549-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224549-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | CA12 224/4885CA1 113/4885CA2 87/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | CA12 1824/4885CA1 509/4885CA2 634/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | CA12 208/4885CA1 55/4885CA2 82/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | CA12 4634/4885CA1 4446/4885CA2 4741/4885 |
| US-20210063875-A1 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | REN, SLC11A2, BACH1 | CA12 1954/4885CA1 985/4885CA2 240/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | CA12 766/4885CA1 677/4885CA2 109/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.