SCHEMBL394340

SCHEMBL394340

Cc1ccc(CC(C)(C)C)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.61
IDO1 P14902 2/20 0.48
THRA P10827 1/20 0.45
THRB P10828 1/20 0.45
ACHE P22303 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
TAAR1 Q96RJ0 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2A6 P11509 1/20 0.44
TSHR P16473 1/20 0.43
AGXT P21549 2/20 0.42
HPGD P15428 1/20 0.39
SLC6A2 P23975 2/20 0.39
HTR2A P28223 1/20 0.39
SLC6A4 P31645 1/20 0.39
HRH1 P35367 1/20 0.39
HTR2B P41595 1/20 0.39
CHRNA4 P43681 1/20 0.39
SLC6A3 Q01959 1/20 0.39
ESR2 Q92731 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6685103 0.88 ESR1 (0.74) ESR1THRATHRBACHETDP1
SCHEMBL23835673 0.87 ESR1 (0.54) ESR1IDO1THRATHRBTAAR1
SCHEMBL21392005 0.87 ESR1 (0.48) ESR1IDO1THRATHRBACHE
SCHEMBL21110445 0.87 ESR1 (0.48) ESR1IDO1THRATHRBTDP1
SCHEMBL17147385 0.87 TEAD4 (0.54) ESR1IDO1THRATHRBACHE
SCHEMBL14047948 0.84 ESR1 (0.44) ESR1IDO1ACHETDP1TAAR1
SCHEMBL9249326 0.83 IDO1 (0.48) ESR1IDO1ACHETDP1TAAR1
SCHEMBL21100336 0.80 ESR1 (0.64) ESR1THRATHRBTAAR1SLC6A2
SCHEMBL8851001 0.79 IDO1 (0.44) ESR1IDO1ACHETDP1TAAR1
SCHEMBL21410910 0.79 SLC6A2 (0.46) ESR1IDO1ACHETDP1TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 636 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9568821-B2 Patterning process SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-02-14 US claimed
US-9507262-B2 Resist top-coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-29 US claimed
US-20150234278-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-20 US claimed
US-20150234274-A1 RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-20 US claimed
US-7413849-B2 Substituted benzene developing solvent for photopolymerizable printing plates NUPRO TECHNOLOGIES (US) 2008-08-19 US claimed
US-20060057498-A1 Substituted benzene developing solvent for photopolymerizable printing plates EASTMAN KODAK COMPANY 2006-03-16 US claimed
EP-1589091-A1 Ethanol-Containing motor fuels for spark ignition combustion engines having reduced vapour pressure Hull, Angelica (SE) 2005-10-26 EP claimed
EP-1252268-B1 METHOD OF REDUCING THE VAPOUR PRESSURE OF ETHANOL-CONTAINING MOTOR FUELS FOR SPARK IGNITION COMBUSTION ENGINES HULL ANGELICA (SE) 2005-05-25 EP claimed
US-4623662-A ANTICHOLESTEROL, ANTILIPEMIC AMERICAN CYANAMID COMPANY (US) 1986-11-18 US claimed
EP-0089149-B1 A POLYETHYLENE ETHER RESIN COMPOSITION Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1986-08-20 EP claimed
US-4599380-A Polyphenylene ether resin composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1986-07-08 US claimed
EP-0089149-A1 A polyethylene ether resin composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-09-21 EP claimed
US-3933917-A Production of dimethylbenzophenone BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-01-20 US claimed
US-12590219-B2 Phenol compound, conductive paste composition, method for producing conductive paste composition, conductive wire, and method for producing conductive wire SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-31 US disclosed
EP-4654222-A1 DEEP EUTECTIC LIQUID, BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-26 EP disclosed
US-20250352110-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-20 US disclosed
US-4599380-A Polyphenylene ether resin composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1986-07-08 US disclosed
US-3933917-A Production of dimethylbenzophenone BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-01-20 US disclosed
US-3933917-A Production of dimethylbenzophenone BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-01-20 US disclosed
US-3931251-A FROM ANTHRAQUINONE, PURIFICATION USING SULFUROUS ACID SALT BAYER AKTIENGESELLSCHAFT (DT) 1976-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12590219-B2 Phenol compound, conductive paste composition, method for producing conductive paste composition, conductive wire, and method for producing conductive wire PYCARD, NPR1, TNNC1 ESR1 463/4885IDO1 2519/4885THRA 1175/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.