Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 2/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | GPR3 | P46089 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.30 |
| ▸ | CA2 | P00918 | 2/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
| ▸ | MMP13 | P45452 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL220146 | 1.00 | PTPN1 (0.32) | PTPN1HSD11B1GPR3CA1CA2 | |
| SCHEMBL217001 | 0.92 | GPR3 (0.36) | PTPN1HSD11B1GPR3CA1CA2 | |
| SCHEMBL2443803 | 0.89 | PTPN1 (0.34) | PTPN1HSD11B1GPR3CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3413691 | 0.84 | GPR3 (0.37) | PTPN1HSD11B1GPR3CA1CA2 | |
| SCHEMBL4801237 | 0.84 | CA1 (0.35) | PTPN1HSD11B1GPR3CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2985949 | 0.82 | GPR3 (0.35) | PTPN1HSD11B1GPR3CA1CA2 | |
| SCHEMBL51399 | 0.81 | CA2 (0.38) | PTPN1GPR3CA1CA2MMP1 | |
| SCHEMBL1360857 | 0.81 | CA2 (0.38) | PTPN1CA1CA2MMP1MMP2 | |
| SCHEMBL1482705 | 0.81 | CA2 (0.38) | PTPN1GPR3CA1CA2MMP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3249775 | 0.80 | GPR3 (0.44) | PTPN1HSD11B1GPR3CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |