Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 14/20 | 0.35 |
| ▸ | CA2 | P00918 | 14/20 | 0.35 |
| ▸ | MMP1 | P03956 | 5/20 | 0.35 |
| ▸ | MMP2 | P08253 | 5/20 | 0.35 |
| ▸ | MMP9 | P14780 | 5/20 | 0.35 |
| ▸ | MMP8 | P22894 | 5/20 | 0.35 |
| ▸ | MMP13 | P45452 | 5/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | GPR3 | P46089 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3413691 | 0.94 | GPR3 (0.37) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL3961442 | 0.94 | PTPN1 (0.33) | PTPN1GPR3 | |
| Potassium SCHEMBL3961443 | 0.94 | PTPN1 (0.33) | PTPN1GPR3 | |
| SCHEMBL51399 | 0.92 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1482705 | 0.92 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1360857 | 0.92 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| Perflubutane SCHEMBL6325042 | 0.91 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL546546 | 0.91 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL4535202 | 0.91 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL60437 | 0.91 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7402372-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20050042541-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2005-02-24 | — | — | US | disclosed |