Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | SHBG | P04278 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8627340 | 0.87 | FDPS (0.32) | — | |
| SCHEMBL11336233 | 0.83 | CYP1A2 (0.43) | CYP1A2 | |
| SCHEMBL14473861 | 0.83 | CYP1A2 (0.43) | CYP1A2 | |
| SCHEMBL14504926 | 0.83 | CYP1A2 (0.43) | CYP1A2 | |
| SCHEMBL2067553 | 0.80 | CYP1A2 (0.37) | CYP1A2SHBG | |
| SCHEMBL27532811 | 0.79 | CYP1A2 (0.38) | CYP1A2SHBG | |
| SCHEMBL9580774 | 0.78 | SIGMAR1 (0.38) | — | |
| Hydrochloric Acid SCHEMBL10714381 | 0.76 | SIGMAR1 (0.37) | — | |
| Hydrochloric Acid SCHEMBL6624374 | 0.76 | CYP1A2 (0.32) | CYP1A2 | |
| SCHEMBL8029378 | 0.75 | CYP1A2 (0.42) | CYP1A2SHBGCHRM2CYP2D6CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0676429-B1 | Composition for urethane-based plastic lens | MITSUI CHEMICALS INC (JP) | 2000-12-27 | — | — | EP | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | disclosed |
| US-20250068079-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2025-02-27 | — | — | US | disclosed |
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| CN-117897433-A | Episulfide composition, polymerizable composition, cured product, and optical material | 三井化学株式会社 | 2024-04-16 | — | — | CN | disclosed |
| CN-114269735-B | Dihydro-or tetrahydroquinazoline compound, intermediate thereof, preparation method and application | 南京创济生物医药有限公司 | 2024-02-23 | — | — | CN | disclosed |
| EP-2589701-B1 | METHOD FOR PRODUCING SIZING AGENT-COATED CARBON FIBERS, AND SIZING AGENT-COATED CARBON FIBERS | TORAY INDUSTRIES (JP) | 2019-08-21 | — | — | EP | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| US-10184034-B2 | Carbon fiber forming raw material, formed material, and carbon fiber-reinforced composite material | TORAY INDUSTRIES, INC. (JP) | 2019-01-22 | — | — | US | disclosed |
| EP-2765155-B1 | CARBON FIBER-REINFORCED THERMOPLASTIC RESIN MOLDING MATERIAL AND METHODS FOR PRODUCING SAME | TORAY INDUSTRIES (JP) | 2018-03-14 | — | — | EP | disclosed |
| US-20080206667-A1 | HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2008-08-28 | — | — | US | disclosed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| US-20080199814-A1 | Device manufacturing process utilizing a double patterning process | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| WO-2008070060-A2 | DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-06-12 | — | — | WO | disclosed |
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| EP-0676429-B1 | Composition for urethane-based plastic lens | MITSUI CHEMICALS INC (JP) | 2000-12-27 | — | — | EP | disclosed |
| US-5693738-A | REACTING AN ISOCYANATE AND/OR AN ISOTHIOCYANATE COMPOUND WITH A HYDROXYL AND/OR MERCAPTO-CONTAINING COMPOUND IN THE PRESENCE OF A COMPLEX OF A TERTIARY AMINE AND A LEWIS ACID | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-12-02 | — | — | US | disclosed |
| EP-0676429-A2 | Composition for urethane-base plastic lens | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1995-10-11 | — | — | EP | disclosed |