SCHEMBL396042

SCHEMBL396042

C=C(C)C(=O)Oc1cc(S(=O)(=O)NC)cc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ TSHR P16473 1/20 0.41
▸ ALDH1A1 P00352 4/20 0.40
▸ GAA P10253 2/20 0.40
▸ PGR P06401 1/20 0.40
▸ PTGS1 P23219 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ HSD17B10 Q99714 1/20 0.40
▸ NQO2 P16083 1/20 0.39
▸ MTNR1A P48039 1/20 0.39
▸ HCRTR1 O43613 1/20 0.39
▸ TP53 P04637 1/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ KMT2A Q03164 3/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ PKM P14618 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.36
▸ ELANE P08246 1/20 0.36
▸ CASP6 P55212 1/20 0.35
▸ G6PD P11413 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL393928 0.86 ALDH1A1 (0.40) TSHRALDH1A1MAPK1HSD17B10HCRTR1
SCHEMBL397324 0.84 MEN1 (0.42) ALDH1A1GAAPGRPTGS1MAPK1
SCHEMBL9568593 0.84 L3MBTL1 (0.48) L3MBTL1TSHRALDH1A1GAAPGR
SCHEMBL10040371 0.76 NQO2 (0.44) L3MBTL1ALDH1A1GAAPGRPTGS1
SCHEMBL13588240 0.76 CYP1A2 (0.44) L3MBTL1ALDH1A1GAAPGRPTGS1
SCHEMBL13374671 0.76 GPR84 (0.49) TSHRALDH1A1GAAPGRPTGS1
SCHEMBL13588209 0.75 ALDH1A1 (0.51) L3MBTL1TSHRALDH1A1GAAPGR
SCHEMBL11982346 0.74 ELANE (0.47) TSHRALDH1A1GAAPGRPTGS1
SCHEMBL3253174 0.74 ELANE (0.42) L3MBTL1TSHRALDH1A1TDP1ELANE
Sulfuric Acid SCHEMBL3802923 0.74 ALDH1A1 (0.54) L3MBTL1TSHRALDH1A1GAAPGR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 — — US disclosed
US-8101332-B2 Negative-working lithographic printing plate precursor and method of lithographic printing using same FUJIFILM CORPORATION (JP) 2012-01-24 — — US disclosed
EP-1972440-B1 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM CORP (JP) 2010-06-23 — — EP disclosed
EP-1136886-B1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORP (JP) 2010-05-19 — — EP disclosed
US-20090246688-A1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME FUJIFILM CORPORATION (JP) 2009-10-01 — — US disclosed
EP-2105298-A1 Negative-working lithographic printing plate precursor and method of lithographic printing using same Fujifilm Corporation (JP) 2009-09-30 — — EP disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 — — US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 — — EP disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 — — US disclosed
US-20010041299-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORPORATION (JP) 2001-11-15 — — US disclosed
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 — — EP disclosed
EP-1136886-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2001-09-26 — — EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 — — EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 — — US disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 L3MBTL1 1189/4885TSHR 4790/4885ALDH1A1 1302/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback