Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | PPARD | Q03181 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4070737 | 0.82 | NOTUM (0.40) | KIF11MEN1KMT2ASLC6A2SLC6A4 | |
| SCHEMBL592654 | 0.79 | CA4 (0.44) | KDM4EALDH1A1 | |
| SCHEMBL7705584 | 0.77 | ELANE (0.53) | MEN1KMT2A | |
| SCHEMBL360859 | 0.76 | LTA4H (0.48) | RIPK1TSHR | |
| SCHEMBL322651 | 0.76 | KIF11 (0.41) | KIF11KDM4EALDH1A1TSHRKMT2A | |
| SCHEMBL3735033 | 0.75 | KMT2A (0.42) | MEN1ALDH1A1POLBKMT2ACYP2C9 | |
| SCHEMBL3735038 | 0.75 | NQO1 (0.50) | KDM4EMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL6790654 | 0.75 | RIPK1 (0.34) | RIPK1KIF11PPARG | |
| SCHEMBL7861289 | 0.74 | NPC1 (0.43) | RIPK1KIF11KDM4EMEN1ALDH1A1 | |
| SCHEMBL2788809 | 0.74 | KIF11 (0.44) | KIF11KDM4EALDH1A1TSHRKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-9914687-B2 | Composition containing vinyl-group-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| US-20160046552-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-18 | — | — | US | disclosed |
| EP-2980058-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2016-02-03 | — | — | EP | disclosed |
| US-9244346-B2 | Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20140231729-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| EP-2725423-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2014-04-30 | — | — | EP | disclosed |
| EP-1788436-B1 | Rework process for photoresist film | SHINETSU CHEMICAL CO (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-1788437-B1 | Rework process for photoresist film | SHINETSU CHEMICAL CO (JP) | 2009-12-23 | — | — | EP | disclosed |
| US-7476485-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2009-01-13 | — | — | US | disclosed |
| EP-1788436-A1 | Rework process for photoresist film | Shin-Etsu Chemical Company, Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1788437-A2 | Rework process for photoresist film | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-7214743-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| US-5612170-A | SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-03-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160046552-A1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | C5, C1S, C1R | RIPK1 3422/4885KIF11 2822/4885KDM4E 293/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.