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Sugi Predict / Compounds / SCHEMBL3967301

SCHEMBL3967301

SCHEMBL3967301

O=S(=O)(c1ccccc1)c1ccc(C2(C3(c4ccc(S(=O)(=O)c5ccccc5)cc4)N=C(c4ccccc4)C(c4ccccc4)(c4ccccc4)N3)N=CC(c3ccccc3)=N2)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5010716 0.75 HDAC6 (0.31) —
SCHEMBL4256237 0.73 — —
SCHEMBL4359690 0.70 — —
SCHEMBL491028 0.66 HTR6 (0.50) —
(Phenylsulfonyl)Benzene SCHEMBL28196220 0.57 HTR6 (0.74) —
SCHEMBL3026340 0.57 HTR6 (0.74) —
(Phenylsulfonyl)Benzene SCHEMBL2148473 0.57 HTR6 (0.82) —
SCHEMBL5051390 0.56 HTR6 (0.93) —
SCHEMBL490762 0.56 CA2 (0.56) —
SCHEMBL9001233 0.55 HTR6 (0.68) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 — — US disclosed
WO-2009040104-A1 METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 2009-04-02 — — WO disclosed
EP-1987396-A1 UV-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH BENZOXAZOLE DERIVATIVE AND ANALOGUES THEREOF AS SENSITIZER Kodak Graphic Communications GmbH (DE) 2008-11-05 — — EP disclosed
WO-2007090550-A1 UV-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH BENZOXAZOLE DERIVATIVE AND ANALOGUES THEREOF AS SENSITIZER KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2007-08-16 — — WO disclosed