Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 14/20 | 0.56 |
| ▸ | CA9 | Q16790 | 12/20 | 0.56 |
| ▸ | CA1 | P00915 | 11/20 | 0.56 |
| ▸ | CA12 | O43570 | 10/20 | 0.56 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.49 |
| ▸ | MAOA | P21397 | 1/20 | 0.49 |
| ▸ | MAOB | P27338 | 1/20 | 0.49 |
| ▸ | CA7 | P43166 | 2/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.48 |
| ▸ | CA4 | P22748 | 2/20 | 0.48 |
| ▸ | CA5A | P35218 | 2/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | CA6 | P23280 | 1/20 | 0.48 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.48 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.48 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL491028 | 0.86 | HTR6 (0.50) | CA2CA9CA1CA12TDP1 | |
| SCHEMBL2454080 | 0.78 | CA2 (0.35) | CA2CA9CA1CA12PTGS2 | |
| SCHEMBL491053 | 0.78 | ALDH1A1 (0.39) | — | |
| SCHEMBL308881 | 0.73 | CA2 (1.00) | CA2CA9CA1CA12PTGS2 | |
| SCHEMBL6482321 | 0.73 | CA2 (1.00) | CA2CA9CA1CA12PTGS2 | |
| SCHEMBL8664748 | 0.73 | CYP1A2 (0.48) | — | |
| SCHEMBL14973574 | 0.73 | NPC1 (0.41) | TDP1 | |
| SCHEMBL5554839 | 0.73 | ALDH1A1 (0.48) | TDP1 | |
| SCHEMBL490744 | 0.73 | NPY5R (0.44) | — | |
| Hydrochloric Acid SCHEMBL30685243 | 0.72 | CA2 (0.95) | CA2CA9CA1CA12PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| WO-2007009580-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2007-01-25 | — | — | WO | disclosed |
| EP-1690138-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | Kodak Polychrome Graphics GmbH (DE) | 2006-08-16 | — | — | EP | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2005054952-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-06-16 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |