SCHEMBL399699

SCHEMBL399699

C=C(CC[Si](C)(C)C)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.37
TET3 O43151 1/20 0.34
TET1 Q8NFU7 1/20 0.34
TBXAS1 P24557 2/20 0.33
GRIK1 P39086 1/20 0.33
GRIK2 Q13002 1/20 0.33
GRM1 Q13255 1/20 0.33
GRM2 Q14416 1/20 0.33
ALOX15 P16050 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL225184 0.86 TBXAS1 (0.39) TET2TET3TET1TBXAS1GRIK1
SCHEMBL809453 0.84 TBXAS1 (0.41) TET2TET3TET1TBXAS1GRIK1
SCHEMBL6364017 0.81 TET2 (0.34) TET2TET3TET1TBXAS1GRIK1
Styrene SCHEMBL18036702 0.80 ALDH1A1 (0.45)
SCHEMBL1581340 0.76 TET2 (0.31) TET2
SCHEMBL8468384 0.76 TET2 (0.31) TET2
SCHEMBL809290 0.76 TBXAS1 (0.39) TET2TBXAS1
SCHEMBL8465355 0.76 TET2 (0.31) TET2
SCHEMBL23413448 0.75 TET2 (0.33) TET2TET3TET1TBXAS1GRIK1
SCHEMBL273086 0.74 TET2 (0.46) TET2TET3TET1TBXAS1GRIK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7029814-B2 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications SAMSUNG ELECTRONICS COMPANY (KR) 2006-04-18 US claimed
EP-1494087-A2 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications Samsung Electronics Co., Ltd. (KR) 2005-01-05 EP claimed
US-20040265725-A1 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2004-12-30 US claimed
EP-0657751-B1 Soft ocular lens material MENICON CO LTD (JP) 2003-04-23 EP claimed
US-5883152-A HARD CONTACT LENS CONSISTING OF A COPOLYMER OF CARBOXYLIC ACID ESTER MONOMER, TRIS(TRIMETHYLSILOXY)SILYLPROPYL(METH)ACRYLATE, AND COPOLYMERIZABLE MONOMER NIPPON OIL AND FATS CO., LTD. (JP) 1999-03-16 US claimed
EP-0379173-B1 Energy beam lithography resist materials FUJITSU LTD (JP) 1994-06-08 EP claimed
EP-0330209-B1 PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST BASF Aktiengesellschaft (DE) 1993-07-21 EP claimed
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP claimed
US-11001647-B2 Soft silicone medical devices ALCON INC. (CH) 2021-05-11 US disclosed
US-10598825-B2 Soft silicone medical devices with durable lubricious coatings thereon ALCON INC. (CH) 2020-03-24 US disclosed
US-20190257980-A1 SOFT SILICONE MEDICAL DEVICES WITH DURABLE LUBRICIOUS COATINGS THEREON ALCON INC. (CH) 2019-08-22 US disclosed
US-10324233-B2 Soft silicone medical devices with durable lubricious coatings thereon NOVARTIS AG (CH) 2019-06-18 US disclosed
US-20190177444-A1 SOFT SILICONE MEDICAL DEVICES ALCON INC. (CH) 2019-06-13 US disclosed
US-10253112-B2 Soft silicone medical devices NOVARTIS AG (CH) 2019-04-09 US disclosed
EP-0388484-B1 High resolution photoresist SIEMENS AG (DE) 1994-09-21 EP disclosed
EP-0330209-B1 PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST BASF Aktiengesellschaft (DE) 1993-07-21 EP disclosed
EP-0481431-A2 Pressurized fluid composition and process for making same UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION, Three Cristina Centre (US) 1992-04-22 EP disclosed
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP disclosed
EP-0330209-A2 Photoreactive polymers and process for the production of a two-layer resist BASF Aktiengesellschaft (DE) 1989-08-30 EP disclosed
EP-0277555-A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices BASF Aktiengesellschaft (DE) 1988-08-10 EP disclosed