Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | MGLL | Q99685 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | BCHE | P06276 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9800577 | 0.80 | HPGD (0.52) | TSHRALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL31644253 | 0.76 | LDHA (0.42) | TSHRKMT2AMEN1 | |
| SCHEMBL113064 | 0.75 | LDHA (0.41) | TSHRKMT2AMEN1LMNA | |
| SCHEMBL28212340 | 0.75 | LDHA (0.41) | TSHRKMT2AMEN1LMNA | |
| SCHEMBL28249125 | 0.74 | KMT2A (0.56) | TSHRALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL11767175 | 0.72 | TRPV1 (0.51) | ALDH1A1HPGD | |
| SCHEMBL16965622 | 0.70 | ALDH1A1 (0.38) | TSHRALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL5680559 | 0.70 | LDHA (0.49) | KMT2AMEN1 | |
| SCHEMBL27797201 | 0.70 | GPR119 (0.40) | TSHRALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL13979987 | 0.69 | NPC1 (0.52) | TSHRALDH1A1KMT2AMEN1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2009074522-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | WO | disclosed |