SCHEMBL402403

SCHEMBL402403

O=C(O)C1(C(=O)OC(=O)C2(C(=O)O)CCCCC2)CCCCC1

nearest known ligand 0.55

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.38
NPSR1 Q6W5P4 1/20 0.31
AKR1C1 Q04828 1/20 0.31
USP2 O75604 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
TSHR P16473 1/20 0.31
BLM P54132 1/20 0.31
CACNA2D1 P54289 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
FFAR3 O14843 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6377357 0.97 CYP2C19 (0.34) CYP2C19NPSR1AKR1C1FFAR3
SCHEMBL6376842 0.92 FFAR3 (0.32) CYP2C19FFAR3
SCHEMBL11758545 0.87 FFAR3 (0.35) FFAR3
SCHEMBL28428027 0.85 CYP2C19 (0.38) CYP2C19NPSR1AKR1C1USP2ALDH1A1
SCHEMBL22279236 0.83 CYP2C19 (0.37) CYP2C19NPSR1AKR1C1USP2ALDH1A1
SCHEMBL902070 0.81 NPSR1 (0.47) CYP2C19NPSR1ALDH1A1LMNATSHR
SCHEMBL9806701 0.81 NPSR1 (0.47) CYP2C19NPSR1ALDH1A1LMNATSHR
SCHEMBL7440708 0.81 NPSR1 (0.47) CYP2C19NPSR1ALDH1A1LMNATSHR
SCHEMBL10823231 0.81 CYP2C19 (0.35) CYP2C19
SCHEMBL466149 0.81 CYP2C19 (0.46) CYP2C19NPSR1AKR1C1USP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1809 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240427247-A1 Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Method For Manufacturing Compound For Forming Metal-Containing Film, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-26 US claimed
EP-4474524-A2 COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, METHOD FOR MANUFACTURING COMPOUND FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-11 EP claimed
CN-119101081-A Metal-containing film-forming compound, metal-containing film-forming composition, method for producing metal-containing film-forming compound, and pattern-forming method 信越化学工业株式会社 2024-12-10 CN claimed
CN-118562106-A Resin for road marking, preparation method of resin and road marking paint 吉安新茂林化有限公司 2024-08-30 CN claimed
US-12027670-B2 Non-aqueous electrolyte solution and lithium secondary battery including the same LG ENERGY SOLUTION, LTD. (KR) 2024-07-02 US claimed
CN-118184895-A Preparation method and application of polyurethane resin 南京聚发新材料有限公司 2024-06-14 CN claimed
EP-3734738-B1 NON-AQUEOUS ELECTROLYTE SOLUTION AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME LG ENERGY SOLUTION LTD (KR) 2024-03-20 EP claimed
CN-117696019-A Plant fiber-based adsorption material and preparation method and application thereof 中国科学院赣江创新研究院 2024-03-15 CN claimed
CN-117510844-A Positive photosensitive polyimide resin and preparation method and application thereof 中国科学院福建物质结构研究所 2024-02-06 CN claimed
CN-114891194-B Double-functional polymer catalyst for synthesizing polyester and application thereof 中国科学院长春应用化学研究所 2023-08-29 CN claimed
US-20030054259-A1 Nonaqueous secondary cell GS YUASA INTERNATIONAL LTD. (JP) 2003-03-20 US claimed
EP-1276165-A1 Nonaqueous secondary cell Japan Storage Battery Co., Ltd. (JP) 2003-01-15 EP claimed
US-6467676-B1 A HYDROXYL-CONTAINING FLUXING PRECURSOR COMPOUND IS ADDED TO THE ENCAPSULANT COMPOSITION TO REACT WITH THE ANHYDRIDE CURING AGENT TO PRODUCE AN ACTIVE FLUXING AGENT UNDER TYPICAL REFLOW CONDITIONS. ADVANPACK SOLUTIONS PTE LTD. (SG) 2002-10-22 US claimed
US-20010047096-A1 Amidation of an acid anhydride by a compound comprising a nitrogen/sulfur saturated ring, e.g., thiazolidine; odorless corrosion inhibitors for metal; pollution control NIPPON SHOKUBAI CO., LTD. (JP) 2001-11-29 US claimed
EP-0836627-B1 POLYMER MATERIAL, PROCESS FOR ITS PRODUCTION AND USE THEREOF PREFORM RAUMGLIEDERUNGSSYSTEME (DE) 2001-10-17 EP claimed
EP-0755375-B1 AQUEOUS PROCESS FOR PREPARING AMIDO-CARBOXYLIC ACIDS BY REACTING AN AMINO ACID WITH A CARBOXYLIC ACID ANHYDRIDE EASTMAN CHEM CO (US) 1999-10-13 EP claimed
US-RE36234-E Aspartic acid copolymers and their preparation DONLAR CORPORATION (US) 1999-06-22 US claimed
EP-0755375-A1 AQUEOUS PROCESS FOR PREPARING AMIDO-CARBOXYLIC ACIDS BY REACTING AN AMINO ACID WITH A CARBOXYLIC ACID ANHYDRIDE EASTMAN CHEMICAL COMPANY (US) 1997-01-29 EP claimed
WO-1995028381-A1 AQUEOUS PROCESS FOR PREPARING AMIDO-CARBOXYLIC ACIDS BY REACTING AN AMINO ACID WITH A CARBOXYLIC ACID ANHYDRIDE EASTMAN CHEMICAL COMPANY (US) 1995-10-26 WO claimed
US-5391780-A Heating a mixture of water and lactam to hydrolyze; cooling; amididation by a carboxylic anhydride; separation of water and organic layer-containing product EASTMAN CHEMICAL COMPANY (US) 1995-02-21 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240427247-A1 Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Method For Manufacturing Compound For Forming Metal-Containing Film, And Patterning Process CAD, CA1, FEM1B CYP2C19 2537/4885NPSR1 4764/4885AKR1C1 3227/4885
US-20010047096-A1 Amidation of an acid anhydride by a compound comprising a nitrogen/sulfur saturated ring, e.g., thiazolidine; odorless corrosion inhibitors for metal; pollution control CTH, TST, SLC7A11 CYP2C19 2478/4885NPSR1 2472/4885AKR1C1 1617/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.