Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 known ✓ | P11229 | 1/20 | 0.34 |
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 10/20 | 0.35 |
| ▸ | ESR1 | P03372 | 9/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | MAOA | P21397 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.34 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL276611 | 0.98 | ESR2 (0.36) | ESR2ESR1CYP3A4MAOACHRM1 | |
| SCHEMBL4569603 | 0.96 | ESR2 (0.37) | ESR2ESR1CYP3A4MAOACHRM1 | |
| Hydrochloric Acid SCHEMBL10959012 | 0.79 | TYR (0.35) | MEN1ALDH1A1MAPTKMT2AALOX5 | |
| SCHEMBL795641 | 0.72 | CYP3A4 (0.39) | CYP3A4MAOACHRM1ALOX15TBXA2R | |
| Hydrochloric Acid SCHEMBL5665257 | 0.72 | ACHE (0.38) | CYP3A4ACHEALDH1A1TSHR | |
| Perchlorate SCHEMBL11660672 | 0.70 | TP53 (0.33) | — | |
| SCHEMBL4569605 | 0.70 | ACHE (0.39) | CYP3A4ACHEALDH1A1TSHR | |
| SCHEMBL133003 | 0.65 | ALDH1A1 (0.40) | ESR2ESR1CYP3A4ALOX15ACHE | |
| SCHEMBL134940 | 0.64 | ACHE (0.44) | ESR2ESR1CYP3A4ACHEKDM4E | |
| SCHEMBL2163898 | 0.64 | ESR2 (0.49) | ESR2ESR1ACHELMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025128334-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128332-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| EP-3398202-B1 | PHOTOSENSITIVE STACKED STRUCTURE | FUJIFILM ELECTRONIC MAT USA INC (US) | 2023-08-09 | — | — | EP | disclosed |
| CN-108701582-B | Photosensitive stacked structure | 富士胶片电子材料美国有限公司 | 2023-05-02 | — | — | CN | disclosed |
| US-11175582-B2 | Photosensitive stacked structure | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | disclosed |
| US-20190018321-A1 | PHOTOSENSITIVE STACKED STRUCTURE | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-01-17 | — | — | US | disclosed |
| EP-3398202-A1 | PHOTOSENSITIVE STACKED STRUCTURE | FujiFilm Electronic Materials USA, Inc. (US) | 2018-11-07 | — | — | EP | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| US-5369200-A | Positive photoresist having improved processing properties | CIBA-GEIGY AG (CH) | 1994-11-29 | — | — | US | disclosed |
| EP-0624827-A1 | Method of making micropatterns | CIBA-GEIGY AG (CH) | 1994-11-17 | — | — | EP | disclosed |
| EP-0601974-A1 | Positive photoresist with better properties | OCG Microelectronic Materials Inc. (US) | 1994-06-15 | — | — | EP | disclosed |
| US-5274060-A | Copolymers crosslinkable by acid catalysis | CIBA-GEIGY CORPORATION (US) | 1993-12-28 | — | — | US | disclosed |
| US-5238781-A | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYPHENOLS AND ACETALS | CIBA-GEIGY CORPORATION (US) | 1993-08-24 | — | — | US | disclosed |
| EP-0502819-A1 | Acid hardenable copolymers | CIBA-GEIGY AG (CH) | 1992-09-09 | — | — | EP | disclosed |
| EP-0501919-A1 | Radiation-sensitive compositions based on polyphenols and acetals | CIBA-GEIGY AG (CH) | 1992-09-02 | — | — | EP | disclosed |
| EP-0085024-B1 | METHOD FOR PRODUCING IMAGES IN PHOTORESIST LAYERS | CIBA-GEIGY AG (CH) | 1987-07-15 | — | — | EP | disclosed |
| US-4439517-A | Process for the formation of images with epoxide resin | CIBA-GEIGY CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
| EP-0085024-A2 | Method for producing images in photoresist layers | CIBA-GEIGY AG (CH) | 1983-08-03 | — | — | EP | disclosed |