SCHEMBL4064913

SCHEMBL4064913

Cc1cc(CO)c(C)cc1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.54
PKM P14618 2/20 0.50
KDM4E B2RXH2 2/20 0.50
NPSR1 Q6W5P4 2/20 0.50
ALDH1A1 P00352 2/20 0.50
CYP1A2 P05177 1/20 0.50
CYP3A4 P08684 1/20 0.50
CYP2D6 P10635 1/20 0.50
MAPT P10636 1/20 0.50
G6PD P11413 1/20 0.50
CYP2C9 P11712 1/20 0.50
HPGD P15428 1/20 0.50
ALOX15 P16050 1/20 0.50
ALOX12 P18054 1/20 0.50
MAPK1 P28482 1/20 0.50
CYP2C19 P33261 1/20 0.50
CCR6 P51684 1/20 0.50
HIF1A Q16665 1/20 0.50
HSD17B10 Q99714 1/20 0.50
CASP6 P55212 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30595358 1.00 SHBG (0.54) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL28472333 0.90 SHBG (0.48) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL5097086 0.87 SHBG (0.52) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL336522 0.85 SHBG (0.48) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL5075167 0.85 SHBG (0.54) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL14283762 0.85 KDM4E (0.50) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL29713830 0.82 ALDH1A1 (0.52) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL224889 0.82 ALDH1A1 (0.52) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL394846 0.81 SHBG (0.48) SHBGPKMKDM4ENPSR1ALDH1A1
SCHEMBL14755445 0.81 ALDH1A1 (0.46) SHBGPKMKDM4ENPSR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0695740-B1 Quinonediazide sulfonic acid esters and positive photoresist compositions comprising the same SUMITOMO CHEMICAL CO (JP) 2000-11-22 EP claimed
EP-0695740-A1 Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-02-07 EP claimed
JP-8099922-A None JP disclosed
JP-9194415-A None JP disclosed
US-20230416460-A1 COMPOUND, RESIN COMPOSITION, RESIN SHEET, RESIN CURED PRODUCT, AND LAMINATED SUBSTRATE TDK CORPORATION (JP) 2023-12-28 US disclosed
CN-116490355-A Compound, resin composition, resin sheet, resin cured product, and laminated substrate TDK株式会社 2023-07-25 CN disclosed
WO-2022209495-A1 COMPOUND, RESIN COMPOSITION, RESIN SHEET, RESIN CURED OBJECT, AND LAMINATED SUBSTRATE TDK株式会社 2022-10-06 WO disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-7202359-B2 Azaoxa heterocyclic compound and method of preparing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2007-04-10 US disclosed
US-20050085634-A1 Azaoxa heterocyclic compound and method of preparing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2005-04-21 US disclosed
US-20040068084-A1 Azaoxa heterocyclic compound and method of preparing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2004-04-08 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
EP-0695740-B1 Quinonediazide sulfonic acid esters and positive photoresist compositions comprising the same SUMITOMO CHEMICAL CO (JP) 2000-11-22 EP disclosed
US-5866724-A Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
JP-H09194415-A BINUCLEAR PHENOL COMPOUND, ITS PRODUCTION AND USE THEREOF SUMITOMO CHEM CO LTD 1997-07-29 JP disclosed
EP-0769485-A1 Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-04-23 EP disclosed
JP-H0899922-A POLYHYDRIC PHENOL COMPOUND, ITS PRODUCTION AND USE SUMITOMO CHEM CO LTD 1996-04-16 JP disclosed
EP-0695740-A1 Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-02-07 EP disclosed
US-5166398-A Anticholesterol agents or atherosclerosis WARNER-LAMBERT CO. (US) 1992-11-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040068084-A1 Azaoxa heterocyclic compound and method of preparing the same AOX1, KDM1A, BMI1 SHBG 3587/4885PKM 3622/4885KDM4E 47/4885
US-20050085634-A1 Azaoxa heterocyclic compound and method of preparing the same AOX1, KDM1A, BMI1 SHBG 3383/4885PKM 3546/4885KDM4E 36/4885
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM SHBG 3960/4885PKM 1671/4885KDM4E 1317/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.