SCHEMBL4066072

SCHEMBL4066072

C=C(C)OC(COc1ccccc1)C1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.41
TSHR P16473 2/20 0.40
CYP2D6 P10635 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
HIF1A Q16665 1/20 0.40
MTNR1A P48039 3/20 0.38
MTNR1B P49286 3/20 0.38
ADRB2 P07550 1/20 0.38
ADRB1 P08588 1/20 0.38
ADRB3 P13945 1/20 0.38
ALOX5 P09917 1/20 0.38
KDM4E B2RXH2 1/20 0.38
NPC1 O15118 1/20 0.37
PKM P14618 1/20 0.37
EPHX2 P34913 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
METAP2 P50579 2/20 0.36
METAP1 P53582 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4066075 0.78 TSHR (0.37) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL3089313 0.77 LMNA (0.39) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL7809168 0.74 LMNA (0.50) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL29173087 0.72 SHBG (0.34) LMNAKDM4ESMN1; SMN2
SCHEMBL5146018 0.71 LMNA (0.40) LMNATSHRCYP2D6MEN1KMT2A
Cyclohexanol SCHEMBL7864093 0.68 LMNA (0.69) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL13431017 0.67 SMN1; SMN2 (0.49) LMNACYP2D6MTNR1AMTNR1BKDM4E
SCHEMBL6727689 0.66 SCN4A (0.55) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL6727693 0.66 SCN4A (0.55) LMNATSHRCYP2D6MEN1KMT2A
SCHEMBL27718594 0.66 IDO1 (0.39) MEN1KMT2AKDM4ERAB9AMETAP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465010-B1 Positive resist composition FUJIFILM CORP (JP) 2009-10-21 EP disclosed
US-7232640-B1 Positive resist composition FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20070128547-A1 POSITIVE RESIST COMPOSITION FUJI PHOTO FILM CO., LTD. 2007-06-07 US disclosed
EP-1465010-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2004-10-06 EP disclosed