SCHEMBL4078043

SCHEMBL4078043

CCO[Si](CI)(c1ccccc1)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.32
TP53 P04637 1/20 0.31
ALDH1A1 P00352 1/20 0.30
HPGD P15428 1/20 0.30
ALOX15 P16050 1/20 0.30
ALOX12 P18054 1/20 0.30
CASP1 P29466 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4082446 0.84 LMNA (0.35) LTA4HALDH1A1HPGD
SCHEMBL647413 0.83 LTA4H (0.34) LTA4HTP53ALDH1A1HPGD
SCHEMBL708759 0.83 LTA4H (0.34) LTA4HTP53ALDH1A1HPGD
SCHEMBL646811 0.83 LTA4H (0.34) LTA4HTP53ALDH1A1HPGD
SCHEMBL705234 0.79 LTA4H (0.32) LTA4HTP53ALDH1A1HPGD
SCHEMBL4081151 0.79 LTA4H (0.32) LTA4HTP53ALDH1A1HPGDALOX15
SCHEMBL4079890 0.79 LTA4H (0.32) LTA4HTP53
SCHEMBL4082788 0.79 LTA4H (0.32) LTA4HTP53ALDH1A1
SCHEMBL703253 0.79 LTA4H (0.32) LTA4HTP53HPGD
SCHEMBL646950 0.79 TSHR (0.33) LTA4HTP53HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed