SCHEMBL4082446

SCHEMBL4082446

CCCO[Si](CI)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
ALDH1A1 P00352 3/20 0.33
HPGD P15428 1/20 0.33
LTA4H P09960 2/20 0.32
TSHR P16473 2/20 0.32
HTT P42858 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706837 0.86 LMNA (0.38) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4078043 0.84 LTA4H (0.32) ALDH1A1HPGDLTA4H
SCHEMBL708010 0.84 LMNA (0.37) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL704046 0.84 KMT2A (0.37) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL702331 0.82 KMT2A (0.36) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4075448 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4074071 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4077334 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL704098 0.81 LTA4H (0.36) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL707297 0.81 LTA4H (0.36) LMNAMEN1KMT2AALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed