SCHEMBL4082632

SCHEMBL4082632

CCCO[Si](CCl)(OCCC)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
ALDH1A1 P00352 2/20 0.33
HPGD P15428 1/20 0.33
LTA4H P09960 2/20 0.32
TOP2A P11388 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1263434 0.84 LTA4H (0.32) LTA4H
SCHEMBL706072 0.84 LMNA (0.37) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL705446 0.84 LMNA (0.37) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL702079 0.84 LMNA (0.37) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL702244 0.82 LMNA (0.36) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4077334 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4075448 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL706699 0.81 LTA4H (0.36) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL702211 0.81 LTA4H (0.36) LMNAMEN1KMT2AALDH1A1HPGD
SCHEMBL4086083 0.81 LMNA (0.35) LMNAMEN1KMT2AALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-0068813-B1 FUNGICIDAL 1,2,4-TRIAZOLE AND IMIDAZOLE DERIVATIVES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-09-25 EP disclosed
US-4510136-A A 1-SILYLMETHYL DERIVATIVE; AGRICULTURE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1985-04-09 US disclosed
US-4496551-A Fungicidal imidazole derivatives E. I. DU PONT DE NEMOURS AND COMPANY (US) 1985-01-29 US disclosed
EP-0068813-A2 Fungicidal 1,2,4-triazole and imidazole derivatives E.I. DU PONT DE NEMOURS AND COMPANY (US) 1983-01-05 EP disclosed