SCHEMBL4085688

SCHEMBL4085688

CC(C)(C)Oc1cccc(-c2cccc(S)c2-c2cccc(OC(C)(C)C)c2)c1.CC(C)(C)Oc1cccc([S+](c2ccccc2)c2ccccc2)c1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PRKDC P78527 1/20 0.34
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
AKR1C4 P17516 1/20 0.31
AKR1C3 P42330 1/20 0.31
AKR1C2 P52895 1/20 0.31
AKR1C1 Q04828 1/20 0.31
HSP90AA1 P07900 1/20 0.31
HSP90AB1 P08238 1/20 0.31
ADORA2A P29274 1/20 0.31
ADORA1 P30542 1/20 0.31
RXRA P19793 1/20 0.30
RXRB P28702 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL244495 0.87 KDM4E (0.40) PRKDCKDM4EMEN1ALDH1A1HPGD
SCHEMBL244494 0.80 KIF11 (0.40) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL246752 0.80 KIF11 (0.40) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL4085684 0.80 KIF11 (0.40) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL29827873 0.80 KIF11 (0.40) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL1263081 0.79 KDM4E (0.42) PRKDCKDM4EMEN1ALDH1A1HPGD
Hydrochloric Acid SCHEMBL6760310 0.79 KIF11 (0.39)
SCHEMBL5415682 0.76 KIF11 (0.41)
SCHEMBL29515905 0.76 KIF11 (0.40) PRKDCKDM4EMEN1ALDH1A1HPGD
SCHEMBL244014 0.76 KIF11 (0.40) PRKDCKDM4EMEN1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527912-B2 Photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-05 US disclosed
US-20080085469-A1 Novel photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080085469-A1 Novel photoacid generators, resist compositions, and patterning process RER1, SCO2, ASIC3 PRKDC 4545/4885KDM4E 4073/4885MEN1 3960/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.