SCHEMBL408787

SCHEMBL408787

CS(=O)(=O)[O-].Cn1cc[n+](C)c1

nearest known ligand 0.35

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.35
NPSR1 Q6W5P4 2/20 0.35
LMNA P02545 1/20 0.35
TP53 P04637 1/20 0.35
THRB P10828 1/20 0.35
RECQL P46063 1/20 0.35
BLM P54132 1/20 0.35
ATM Q13315 1/20 0.35
MEN1 O00255 1/20 0.32
APAF1 O14727 1/20 0.32
NPC1 O15118 1/20 0.32
PLA2G1B P04054 1/20 0.32
HSP90AA1 P07900 1/20 0.32
MAPK1 P28482 1/20 0.32
HTT P42858 1/20 0.32
RAB9A P51151 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ATG4B Q9Y4P1 1/20 0.32
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL4539581 0.93 MAPT (0.36) MAPTNPSR1LMNATP53THRB
Sulfuric Acid SCHEMBL15227677 0.91 MAPT (0.38) MAPTNPSR1LMNATP53THRB
Sulfuric Acid SCHEMBL1293162 0.89 MAPT (0.34) MAPTNPSR1LMNATP53THRB
SCHEMBL409129 0.88 MAPT (0.38) MAPTNPSR1LMNATP53THRB
Methanesulfonamide SCHEMBL29205008 0.87 CA1 (0.35) MAPTNPSR1LMNATP53THRB
SCHEMBL15436957 0.87 MAPT (0.32) MAPTNPSR1LMNATP53THRB
SCHEMBL29074312 0.86 MAPT (0.37) MAPTNPSR1LMNATP53THRB
SCHEMBL305714 0.86 LMNA (0.33) MAPTNPSR1LMNATP53THRB
Trifluoromethanesulfonic Acid SCHEMBL318315 0.84 KCNH2 (0.33) MAPTNPSR1LMNATP53THRB
SCHEMBL35176 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115010836-A Electrochromatic polymer, nano particles and device 吉林大学 2022-09-06 CN claimed
EP-3512905-B1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2022-08-24 EP claimed
CN-109790292-B Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2022-05-31 CN claimed
CN-108949141-B Preparation method of bistable electrochromic material and application of bistable electrochromic material in preparation of electrochromic device 常州铱视光电科技有限公司 2021-02-05 CN claimed
EP-3512905-A1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2019-07-24 EP claimed
US-20180135894-A1 ABSORPTION HEAT PUMP AND SORBENT FOR AN ABSORPTION HEAT PUMP COMPRISING METHANESULFONIC ACID EVONIK DEGUSSA GMBH (DE) 2018-05-17 US claimed
EP-2923158-B1 ABSORPTION HEAT PUMP, AND ABSORPTION AGENT FOR AN ABSORPTION HEAT PUMP COMPRISING METHANESULFONIC ACID EVONIK DEGUSSA GMBH (DE) 2017-01-11 EP claimed
US-20160365228-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION 2016-12-15 US claimed
US-9449797-B2 Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RESEARCH CORPORATION (US) 2016-09-20 US claimed
US-20160175766-A1 METHOD OF PURIFYING AN IONIC LIQUID AND METHOD OF DEHUMIDIFYING AIR EVONIK DEGUSSA GMBH (DE) 2016-06-23 US claimed
US-20150308720-A1 ABSORPTION HEAT PUMP AND SORBENT FOR AN ABSORPTION HEAT PUMP COMPRISING METHANESULFONIC ACID EVONIK DEGUSSA GMBH (DE) 2015-10-29 US claimed
EP-2923158-A1 ABSORPTION HEAT PUMP AND SORBENT FOR AN ABSORPTION HEAT PUMP COMPRISING METHANESULFONIC ACID Evonik Degussa GmbH (DE) 2015-09-30 EP claimed
US-20140335698-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION (US) 2014-11-13 US claimed
WO-2014079675-A1 ABSORPTION HEAT PUMP AND SORBENT FOR AN ABSORPTION HEAT PUMP COMPRISING METHANESULFONIC ACID EVONIK INDUSTRIES AG (DE) 2014-05-30 WO claimed
EP-2735820-A1 Absorption heat pump, and absorption agent for an absorption heat pump comprising methanesulfonic acid Evonik Industries AG (DE) 2014-05-28 EP claimed
US-7659430-B2 Method for separating hydrogen chloride and phosgene BASF AKTIENGESELLSCHAFT (DE) 2010-02-09 US claimed
EP-1789160-B1 METHOD FOR SEPARATING HYDROGEN CHLORIDE AND PHOSGENE BASF SE (DE) 2009-11-18 EP claimed
US-20070293707-A1 Method for Separating Hydrogen Chloride and Phosgene BASF AKTIENGESELLSCHAFT (DE) 2007-12-20 US claimed
CN-118666701-A Preparation method of acyl amino acid surfactant 广州花语精细化工有限公司 2024-09-20 CN disclosed
EP-1449886-A1 POLYELECTROLYTE COMPOSITIONS Ube Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070293707-A1 Method for Separating Hydrogen Chloride and Phosgene PSPH, SLC9B2, HVCN1 MAPT 4430/4885NPSR1 2750/4885LMNA 3631/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.