SCHEMBL4097489

SCHEMBL4097489

C1=CCC([Ti]Oc2ccccc2)=C1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.33
KCNA3 P22001 1/20 0.31
LTA4H P09960 2/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5612735 0.98 CA4 (0.32) CA4KCNA3LTA4HTSHR
Hydrochloric Acid SCHEMBL395657 0.98 CA4 (0.32) CA4KCNA3LTA4HTSHR
Hydrochloric Acid SCHEMBL3184752 0.84 DHFR (0.35) LTA4H
Hydrochloric Acid SCHEMBL28545755 0.80 CYP2A6 (0.42)
Hydrochloric Acid SCHEMBL12815820 0.80 ACHE (0.42)
Hydrochloric Acid SCHEMBL12815696 0.77 MAOB (0.31)
Diphenylether SCHEMBL27491868 0.77 LTA4H (0.46) LTA4HTSHR
Hydrochloric Acid SCHEMBL3190527 0.76 CYP3A4 (0.36)
Hydrochloric Acid SCHEMBL3188162 0.74 ALDH1A1 (0.31) TSHR
SCHEMBL2047705 0.74 CA4 (0.31) CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116693580-A Anthracene skeleton phenol oxygen single metallocene bimetallic catalyst, preparation method and application 万华化学集团股份有限公司 2023-09-05 CN disclosed
US-8247510-B2 Copolymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-21 US disclosed
US-20090171054-A1 HOMOPOLYMER AND COPOLYMER, AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-02 US disclosed
US-20080234450-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-25 US disclosed
US-20080221287-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080221288-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080221286-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080214754-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-04 US disclosed
US-20080214756-A1 CYCLIC OLEFIN-DIENE COPOLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-04 US disclosed
US-20040209762-A1 Metal compound, and catalyst component and catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-21 US disclosed
US-20040209767-A1 Contact product, and catalyst component and catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-21 US disclosed
JP-2001172292-A METHOD FOR PRODUCING THIO(CYCLOPENTADIENYL)(PHENOXY) TITANIUM COMPLEX SUMITOMO CHEM CO LTD 2001-06-26 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040209762-A1 Metal compound, and catalyst component and catalyst for addition polymerization, and process for producing addition polymer AP1M1, PYM1, SEM1 CA4 1089/4885KCNA3 1776/4885LTA4H 2243/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.