Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | RXRA | P19793 | 1/20 | 0.31 |
| ▸ | RXRB | P28702 | 1/20 | 0.31 |
| ▸ | RXRG | P48443 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
| ▸ | SCN10A | Q9Y5Y9 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5204561 | 0.83 | CA1 (0.39) | CA1CA2CA9MAPTSMN1; SMN2 | |
| SCHEMBL7189386 | 0.80 | CYP1A2 (0.40) | CA1CA2CA9MAPT | |
| SCHEMBL7189375 | 0.80 | CYP1A2 (0.40) | CA1CA2CA9MAPT | |
| SCHEMBL6667896 | 0.77 | CA1 (0.39) | CA1CA2CA9MAPTALDH1A1 | |
| SCHEMBL7366742 | 0.77 | SCN10A (0.33) | CA1CA2CA9MAPTSMN1; SMN2 | |
| SCHEMBL5888678 | 0.77 | CA1 (0.36) | CA1CA2CA9MAPTSMN1; SMN2 | |
| SCHEMBL4261446 | 0.76 | CA1 (0.31) | CA1CA2CA9MAPTSMN1; SMN2 | |
| SCHEMBL12098518 | 0.76 | RXRA (0.46) | MAPTSMN1; SMN2ALDH1A1HPGDALOX15 | |
| SCHEMBL4261454 | 0.76 | CA1 (0.31) | CA1CA2CA9MAPTSMN1; SMN2 | |
| SCHEMBL8648687 | 0.75 | TUBB4A (0.39) | CA1CA2CA9MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3532898-B1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | FRAUNHOFER GES FORSCHUNG (DE) | 2024-07-31 | — | — | EP | claimed |
| WO-2024066848-A1 | HIGH-MOLECULAR-WEIGHT NARROW-DISTRIBUTION PHS RESIN, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 上海八亿时空先进材料有限公司 | 2024-04-04 | — | — | WO | claimed |
| CN-115260348-A | High molecular weight and narrow distribution PHS resin and preparation method and application thereof | 北京八亿时空液晶科技股份有限公司 | 2022-11-01 | — | — | CN | claimed |
| US-11292859-B2 | Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer | FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2022-04-05 | — | — | US | claimed |
| US-7141355-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-11-28 | — | — | US | claimed |
| US-5663260-A | Hyperbranched copolymers from AB monomers and C monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-09-02 | — | — | US | claimed |
| EP-4653503-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION, PIGMENT COMPOSITION, INK, AND PRINTED MATERIAL | DIC Corporation (JP) | 2025-11-26 | — | — | EP | disclosed |
| US-20250340749-A1 | AQUEOUS PIGMENT DISPERSION AND PRODUCTION METHOD FOR AQUEOUS PIGMENT DISPERSION | DIC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| US-12460039-B2 | Block copolymer intermediate, block copolymer, and methods for producing same | DIC CORPORATION (JP) | 2025-11-04 | — | — | US | disclosed |
| US-12331148-B2 | Block copolymer intermediate, block copolymer, and production methods for same | DIC CORPORATION (JP) | 2025-06-17 | — | — | US | disclosed |
| EP-3674372-B1 | INK, INK FOR INK-JET RECORDING, PRINTED MATTER, AND METHOD FOR PRODUCING PRINTED MATTER | DAINIPPON INK & CHEMICALS (JP) | 2025-04-23 | — | — | EP | disclosed |
| US-12264251-B2 | Ink, ink for ink-jet recording, printed matter, and method for producing printed matter | DIC CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| WO-2025048577-A1 | METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION | 주식회사 이엔에프테크놀로지 | 2025-03-06 | — | — | WO | disclosed |
| US-5625020-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-04-29 | — | — | US | disclosed |
| WO-1996014345-A1 | HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS | CORNELL RESEARCH FOUNDATION, INC. (US) | 1996-05-17 | — | — | WO | disclosed |
| US-5492793-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-02-20 | — | — | US | disclosed |
| US-5362597-A | Lenses | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0605089-A2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-07-06 | — | — | EP | disclosed |
| EP-0596668-A2 | Process for imaging of photoresist | International Business Machines Corporation (US) | 1994-05-11 | — | — | EP | disclosed |
| EP-0520626-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-30 | — | — | EP | disclosed |