Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 3/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.43 |
| ▸ | MAOA | P21397 | 1/20 | 0.43 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | DYRK1A | Q13627 | 6/20 | 0.42 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | CDK9 | P50750 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4137601 | 0.92 | DYRK1A (0.42) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 | |
| SCHEMBL6119475 | 0.78 | CHRNB2 (0.47) | DYRK1ACHRNB2CHRNA4MEN1ALDH1A1 | |
| SCHEMBL1156058 | 0.75 | NQO2 (0.50) | ACHEDYRK1ACHRNB2CHRNA4MEN1 | |
| SCHEMBL7787699 | 0.75 | DYRK1A (0.44) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 | |
| SCHEMBL4416833 | 0.75 | CYP2A6 (0.64) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 | |
| SCHEMBL941915 | 0.75 | CHRNB2 (0.48) | DYRK1ACHRNB2CHRNA4MEN1ALDH1A1 | |
| SCHEMBL18073955 | 0.74 | HSD17B10 (0.54) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 | |
| SCHEMBL2149910 | 0.72 | CYP2A6 (0.54) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 | |
| SCHEMBL4154736 | 0.72 | NQO2 (0.46) | CYP3A4ACHEHSD17B10DYRK1ACHRNB2 | |
| SCHEMBL14588303 | 0.69 | L3MBTL1 (0.49) | CYP2A6KDM4ECYP3A4CYP2D6CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090092766-A1 | GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| WO-2006123834-A2 | GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2006-11-23 | — | — | WO | disclosed |
| EP-1061411-B1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO LTD (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1067430-B1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO LTD (JP) | 2006-09-13 | — | — | EP | disclosed |
| US-20050271987-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-08 | — | — | US | disclosed |
| US-6838231-B2 | Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040166450-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. | 2004-08-26 | — | — | US | disclosed |
| US-6780577-B2 | A MULTILAYER COMPRISING PHOTOSENSITIVE DYES WITH ABSORPTION SPECTRA AT A HIGH FLUORESCENCE WAVELENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-24 | — | — | US | disclosed |
| US-6730468-B1 | ADSORBED ON SURFACE A SENSITIZING DYE IN MULTIPLE LAYERS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-6692905-B2 | COLOR PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20030180673-A1 | Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2003-09-25 | — | — | US | disclosed |
| US-20030170575-A1 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| US-6610466-B2 | Exhibits increased light absorption and light absorption intensity and which has sensitizing dyes adsorbed in multilayer form stably even in the presence of an organic solvent. | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-26 | — | — | US | disclosed |
| US-6582894-B1 | Silver haide photographic emulsion and photographic light-sensitive material using same | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-24 | — | — | US | disclosed |
| US-6521401-B1 | Spectrally sensitizing with dye that does not have electric charge or forms an inner salt | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-18 | — | — | US | disclosed |
| US-20020177087-A1 | Silver halide photographic lightsensitive material | FUJIFILM CORPORATION (JP) | 2002-11-28 | — | — | US | disclosed |
| US-6465166-B1 | HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING | FUJI PHOTO FILM. CO., LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| US-20020012892-A1 | Methine compound-containing silver halide photographic emulsion and photographic material using the same | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1067430-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2001-01-10 | — | — | EP | disclosed |
| EP-1061411-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-20 | — | — | EP | disclosed |