SCHEMBL4139716

SCHEMBL4139716

O=C(O)CC(C(=O)O)c1c[nH]nn1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
POLB P06746 2/20 0.39
ALDH1A1 P00352 3/20 0.37
GAA P10253 1/20 0.37
CYP1A2 P05177 1/20 0.34
TSHR P16473 1/20 0.34
MEN1 O00255 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
KMT2A Q03164 1/20 0.33
KDM4E B2RXH2 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.30
CPA1 P15085 2/20 0.30
USP2 O75604 1/20 0.30
HSD17B10 Q99714 1/20 0.30
CPB1 P15086 1/20 0.30
CPA3 P15088 1/20 0.30
CPB2 Q96IY4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10761856 0.82 AKR1C3 (0.36)
SCHEMBL15413100 0.79 CPB2 (0.30) CPB2
SCHEMBL16145065 0.75 SRC (0.33)
SCHEMBL30003457 0.73 LMNA (0.35) L3MBTL1POLBKMT2A
SCHEMBL2161089 0.72 PTGS2 (0.33) POLBCYP1A2TSHRCYP2C9
SCHEMBL17846594 0.71 L3MBTL1 (0.39) L3MBTL1TDP1POLBALDH1A1GAA
Hydrochloric Acid SCHEMBL29604330 0.70 POLB (0.33) POLBCYP1A2TSHRCYP2C9
SCHEMBL15796765 0.70
SCHEMBL27397391 0.70 L3MBTL1 (0.36) L3MBTL1TDP1POLBALDH1A1GAA
SCHEMBL3625519 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8083964-B2 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2011-12-27 US disclosed
US-8083964-B2 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2011-12-27 US disclosed
US-20100330809-A1 POLISHING LIQUID FOR METALS FUJIFILM CORPORATION (JP) 2010-12-30 US disclosed
US-20100330809-A1 POLISHING LIQUID FOR METALS FUJIFILM CORPORATION (JP) 2010-12-30 US disclosed
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20080242090-A1 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080242090-A1 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080206995-A1 METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20080206995-A1 METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070200089-A1 Polishing liquid for metals FUJIFILM CORPORATION 2007-08-30 US disclosed
US-20070200089-A1 Polishing liquid for metals FUJIFILM CORPORATION 2007-08-30 US disclosed