SCHEMBL414231

SCHEMBL414231

C=Cc1cccc(OC(=O)OC)c1

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
TP53 P04637 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ALDH1A1 P00352 2/20 0.43
POLB P06746 2/20 0.43
PTGS2 P35354 1/20 0.42
MAOB P27338 3/20 0.40
ACHE P22303 1/20 0.40
KMT2A Q03164 4/20 0.40
BCHE P06276 2/20 0.40
MEN1 O00255 2/20 0.40
FOS P01100 1/20 0.40
JUN P05412 1/20 0.40
LMNA P02545 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8902315 0.86 RELA (0.51) MAPTALDH1A1MAOBBCHEFOS
SCHEMBL8900320 0.86 RELA (0.51) MAPTALDH1A1MAOBBCHEFOS
SCHEMBL5942242 0.86 PTGS2 (0.43) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL411374 0.83 CYP3A4 (0.58) MAPTCYP3A4TP53TDP1ALDH1A1
SCHEMBL2472047 0.83 ELANE (0.47) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL5942581 0.83 KDM4E (0.44) MAPTTP53TDP1ALDH1A1POLB
SCHEMBL5942250 0.82 CA2 (0.44) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL5942162 0.82 ELANE (0.45) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL5942346 0.81 ALDH1A1 (0.41) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL28967683 0.81 TP53 (0.47) MAPTCYP3A4TP53TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025048577-A1 METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION 주식회사 이엔에프테크놀로지 2025-03-06 WO disclosed
CN-107849167-B Method for producing polymer for electronic material and polymer for electronic material obtained by the production method 丸善石油化学株式会社 2021-02-23 CN disclosed
US-9598553-B2 Metal nanoparticle composite and method for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2017-03-21 US disclosed
US-20140058028-A1 METAL NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2014-02-27 US disclosed
EP-2669029-A1 METALLIC NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME Maruzen Petrochemical Co., Ltd. (JP) 2013-12-04 EP disclosed
US-8492483-B2 ABA triblock copolymer and process for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-07-23 US disclosed
US-20120172535-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2012-07-05 US disclosed
EP-2465885-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical Co., Ltd. (JP) 2012-06-20 EP disclosed
EP-2412737-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical CO., LTD. (JP) 2012-02-01 EP disclosed
US-20120022219-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD 2012-01-26 US disclosed
US-20100286351-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-11-11 US disclosed
EP-2186837-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-05-19 EP disclosed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 US disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed