SCHEMBL4147404

SCHEMBL4147404

Oc1ccc(-c2ccc(-c3nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n3)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.46
KMT2A Q03164 5/20 0.46
MAPT P10636 4/20 0.46
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
USP2 O75604 1/20 0.46
TP53 P04637 1/20 0.46
PKM P14618 1/20 0.46
NFKB1 P19838 1/20 0.46
NFKB2 Q00653 1/20 0.46
RELA Q04206 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
NTSR1 P30989 1/20 0.44
ESR1 P03372 5/20 0.44
ESR2 Q92731 5/20 0.44
MMP3 P08254 1/20 0.38
BCL2L1 Q07817 1/20 0.38
KIF11 P52732 1/20 0.38
ALDH1A1 P00352 1/20 0.38
POLB P06746 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8607879 0.98 MEN1 (0.48) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL8956496 0.88 APP (0.40) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL8412982 0.87 NPC1 (0.38) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL17328232 0.85 MEN1 (0.37) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL125466 0.82 MEN1 (0.44) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL125517 0.82 NPC1 (0.50) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL125596 0.80 DEGS1 (0.56) MAPTPOLB
SCHEMBL4147627 0.80 NPC1 (0.40) MEN1KMT2AMAPTNPC1RAB9A
SCHEMBL10071737 0.80 DEGS1 (0.56) MAPTPOLB
SCHEMBL14622036 0.80 MEN1 (0.45) MEN1KMT2AMAPTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230287179-A1 HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME NISSAN CHEMICAL CORPORATION (JP) 2023-09-14 US disclosed
US-20230287179-A1 HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME NISSAN CHEMICAL CORPORATION (JP) 2023-09-14 US disclosed
WO-2020066851-A1 ACRYLIC COATING COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES 日産化学株式会社 2020-04-02 WO disclosed
US-20190256657-A1 HIGHLY SOLUBLE TRIS- (2, 3-EPOXYPROPYL)- ISOCYANURATE AND METHOD FOR PRODUCING SAME NISSAN CHEMICAL CORPORATION (JP) 2019-08-22 US disclosed
US-9428606-B2 Polyfunctional epoxy compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-30 US disclosed
US-9428606-B2 Polyfunctional epoxy compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-30 US disclosed
US-20150353684-A1 HIGHLY SOLUBLE TRIS- (2, 3-EPOXYPROPYL)- ISOCYANURATE AND METHOD FOR PRODUCING SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-10 US disclosed
US-9140989-B2 Photosensitive organic particles NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-09-22 US disclosed
US-9140989-B2 Photosensitive organic particles NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-09-22 US disclosed
US-8828651-B2 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-7341775-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) 2008-03-11 US disclosed
US-7285375-B2 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-10-23 US disclosed
US-7285375-B2 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-10-23 US disclosed
EP-1795553-A1 PROCESS FOR PRODUCING FOAM Oji Paper Co., Ltd. (JP) 2007-06-13 EP disclosed
US-20070020559-A1 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-25 US disclosed
US-20070020559-A1 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-25 US disclosed
US-20070020555-A1 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-01-25 US disclosed
US-20070020555-A1 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-01-25 US disclosed
US-20060210785-A1 Foamed product in a sheet form and method for production thereof OJI PAPER CO., LTD. (JP) 2006-09-21 US disclosed
EP-1647570-A1 FOAMED PRODUCT IN A SHEET FORM AND METHOD FOR PRODUCTION THEREOF Oji Paper Co., Ltd. (JP) 2006-04-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230287179-A1 HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME TTPA, USP1, USP2 MEN1 4080/4885KMT2A 2014/4885MAPT 70/4885
US-20190256657-A1 HIGHLY SOLUBLE TRIS- (2, 3-EPOXYPROPYL)- ISOCYANURATE AND METHOD FOR PRODUCING SAME TTPA, USP1, USP2 MEN1 4080/4885KMT2A 2014/4885MAPT 70/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.