Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | ACHE | P22303 | 2/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1054362 | 0.81 | — | — | |
| SCHEMBL29776859 | 0.81 | — | — | |
| SCHEMBL6859177 | 0.78 | — | — | |
| SCHEMBL2316971 | 0.78 | — | — | |
| SCHEMBL29568659 | 0.78 | — | — | |
| SCHEMBL31216271 | 0.74 | GABRA1 (0.42) | MAPTMGLL | |
| SCHEMBL4582431 | 0.74 | ALDH1A1 (0.48) | TSHRHPGDHSD17B10CYP2A6CYP1A2 | |
| SCHEMBL31216267 | 0.74 | GABRA1 (0.46) | TSHRLMNAMAPTHPGDMGLL | |
| SCHEMBL21201761 | 0.74 | — | — | |
| SCHEMBL355019 | 0.73 | ALDH1A1 (0.44) | TSHRLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6924545-B2 | Low-dielectric-constant interlayer insulating film composed of borazine-silicon-based polymer and semiconductor device | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE (JP) | 2005-08-02 | — | — | US | claimed |
| US-20020142533-A1 | Low-dielectric-constant interlayer insulating film composed of borazine-silicon-based polymer and semiconductor device | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-10-03 | — | — | US | claimed |
| US-8362199-B2 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20110313122-A1 | BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION | MATSUTANI HIROSHI (JP) | 2011-12-22 | — | — | US | disclosed |
| US-7625642-B2 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | HITACHI CHEMICAL CO., LTD (JP) | 2009-12-01 | — | — | US | disclosed |
| US-20090240017-A1 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| US-7427443-B2 | Low dielectric constant insulating material and semiconductor device using the material | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-23 | — | — | US | disclosed |
| US-20060110610-A1 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-05-25 | — | — | US | disclosed |
| US-20060097393-A1 | Low dielectric constant insulating material and semiconductor device using the material | NATIONAL INST. OF ADV. INDUST. SCIENCE AND TECH. (JP) | 2006-05-11 | — | — | US | disclosed |
| US-6924545-B2 | Low-dielectric-constant interlayer insulating film composed of borazine-silicon-based polymer and semiconductor device | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20020142533-A1 | Low-dielectric-constant interlayer insulating film composed of borazine-silicon-based polymer and semiconductor device | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-10-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110313122-A1 | BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION | GRIK5, GJA1, SLC9A5 | TSHR 3288/4885ACHE 1011/4885ALOX12 1115/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.