SCHEMBL4156747

SCHEMBL4156747

CCCC1(C23C=CC(C2)C(C(=O)O)C3)CCOC(=O)C1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4169343 0.91 LMNA (0.33) LMNACYP2C9
SCHEMBL4169863 0.81 LMNA (0.38) LMNACYP2C9
SCHEMBL7048784 0.63 SLC6A12 (0.30)
SCHEMBL4164078 0.61
SCHEMBL7047891 0.60 HSD11B1 (0.33)
SCHEMBL7047883 0.60 HSD11B1 (0.32)
SCHEMBL3883653 0.60 ALDH1A1 (0.34) LMNACYP2C9
SCHEMBL28115075 0.60 GRM2 (0.32) CYP2C9
SCHEMBL9722128 0.59 GRM4 (0.32) CYP2C9
SCHEMBL7047190 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed