SCHEMBL4157874

SCHEMBL4157874

CCCCOC(=O)C(C)(C)/N=N/C(C)(C)C(=O)OCCCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.50
ATM Q13315 1/20 0.47
TSHR P16473 5/20 0.44
HPGD P15428 1/20 0.44
HCAR2 Q8TDS4 1/20 0.41
NAAA Q02083 1/20 0.41
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
EPHX1 P07099 1/20 0.38
ESR1 P03372 2/20 0.38
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP2C19 P33261 1/20 0.38
NR1H2 P55055 1/20 0.38
RNASEL Q05823 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4157878 1.00 ALDH1A1 (0.50) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL7575644 0.94 NAAA (0.48) ALDH1A1ATMTSHRHCAR2NAAA
SCHEMBL7575650 0.94 NAAA (0.48) ALDH1A1ATMTSHRHCAR2NAAA
SCHEMBL28530635 0.93 ALDH1A1 (0.44) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL11208257 0.92 NAAA (0.52) ALDH1A1TSHRHCAR2NAAAEPHX1
SCHEMBL28811188 0.92 NAAA (0.52) ALDH1A1TSHRHCAR2NAAAEPHX1
SCHEMBL7594098 0.87 HCAR2 (0.38) ALDH1A1ATMTSHRHCAR2TDP1
SCHEMBL7594095 0.87 HCAR2 (0.38) ALDH1A1ATMTSHRHCAR2TDP1
SCHEMBL7995691 0.84 ALDH1A1 (0.47) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL6052966 0.82 CYP4F2 (0.45) ALDH1A1NAAATDP1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111918893-A Resin for photoresist, method for producing resin for photoresist, resin composition for photoresist, and pattern formation method 株式会社大赛璐 2020-11-10 CN disclosed
CN-109422970-B High-gas-barrier thermoplastic vulcanized rubber and preparation method thereof 北京化工大学 2020-05-22 CN disclosed
CN-110857327-A Method for producing polymer 株式会社大赛璐 2020-03-03 CN disclosed
US-20090324831-A1 CURABLE RESIN COMPOSITION AND PROCESS FOR PRODUCING CURED COATING USING THE SAME DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2009-12-31 US disclosed
US-20090124776-A1 Cycloaliphatic epoxy (meth)acrylates, preparation processes thereof, and copolymers DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-14 US disclosed
EP-2048196-A1 CURABLE RESIN COMPOSITION AND METHOD FOR FORMING CURED COATING FILM Daicel Chemical Industries, Ltd. (JP) 2009-04-15 EP disclosed
EP-1818327-A1 ALICYCLIC EPOXY (METH)ACRYLATES, PROCESS FOR PRODUCTION THEREOF, AND COPOLYMERS Daicel Chemical Industries, Ltd. (JP) 2007-08-15 EP disclosed
EP-0957114-B1 Azoamide compounds and their use as polymerisation initiators WAKO PURE CHEM IND LTD (JP) 2002-09-25 EP disclosed
EP-0957114-A1 Azoamide compounds and their use as polymerisation initiators Wako Pure Chemical Industries, Ltd. (JP) 1999-11-17 EP disclosed
US-5698647-A Preparation of polymers based on basic vinyl monomers BASF AKTIENGESELLSCHAFT (DE) 1997-12-16 US disclosed
US-4482671-A Base for a graft polymer, novel graft polymer compositions, solvent and water-reducible coatings incorporating the novel graft polymers, and processes for making them SCM CORPORATION (US) 1984-11-13 US disclosed
EP-0017911-B1 POLYMER COMPOSITIONS AND THEIR PRODUCTION SCM CORPORATION (US) 1984-03-21 EP disclosed
US-4399241-A EPOXY RESIN REACTED WITH A POLYHYDROXY OR POLYCARBOXYLIC COMPOUND SCM CORPORATION (US) 1983-08-16 US disclosed
EP-0041108-A2 Base for a graft polymer, novel graft polymer compositions, solvent and water-reducible coatings incorporating the novel polymers, and processes for making them SCM CORPORATION (US) 1981-12-09 EP disclosed
US-4285847-A ADDITION POLYMERIZATION OF AQUEOUS UNSATURATED MONOMERS IN AN AQUEOUS RESIN DISPERSION BY FREE RADICAL CATALYSTS SCM CORPORATION (US) 1981-08-25 US disclosed
EP-0017911-A1 Polymer compositions and their production SCM CORPORATION (US) 1980-10-29 EP disclosed
US-4077932-A VINYL NITROGEN MONOMER, EPOXY SILANE BORDEN, INC. (US) 1978-03-07 US disclosed
US-4057527-A ALKALI METAL OR AMMONIUM POLYACRYLATE, SURFACTANT BORDEN, INC. (US) 1977-11-08 US disclosed
US-4032487-A AQUEOUS ACRYLATE-EPOXY SILANE CROSSLINKER ADHESIVE DISPERSION COMPOSITION BORDEN, INC. (US) 1977-06-28 US disclosed
US-3969560-A Copolymers of monounsaturated or diunsaturated polyesters with vinyl monomers ROHM AND HAAS COMPANY (US) 1976-07-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090124776-A1 Cycloaliphatic epoxy (meth)acrylates, preparation processes thereof, and copolymers MEP1B, MEP1A, ACMSD ALDH1A1 1902/4885ATM 3850/4885TSHR 3947/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.