SCHEMBL4185979

SCHEMBL4185979

O=c1oc2ccccc2cc1COCc1cc2ccccc2oc1=O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.56
MAOB P27338 5/20 0.55
MMP2 P08253 1/20 0.54
MMP9 P14780 1/20 0.54
ADAM17 P78536 1/20 0.54
HPGD P15428 3/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
TYR P14679 1/20 0.53
DAO P14920 1/20 0.53
AKR1B1 P15121 1/20 0.53
POLB P06746 1/20 0.53
RAB9A P51151 4/20 0.51
NPC1 O15118 3/20 0.51
KMT2A Q03164 2/20 0.51
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 3/20 0.50
LGALS3 P17931 2/20 0.49
LGALS9 O00182 1/20 0.49
LGALS8 O00214 1/20 0.49
LGALS2 P05162 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1284769 0.90 MAOB (0.57) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL1285122 0.86 MAOB (0.56) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL24486866 0.85 MMP2 (0.48) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL1284886 0.85 MAOB (0.56) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL13612673 0.83 MAOA (0.61) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL27625488 0.83 MMP2 (0.67) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL15455155 0.83 MMP2 (0.52) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL24486792 0.83 MMP2 (0.46) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL1284616 0.82 MAOB (0.52) MAOAMAOBMMP2MMP9ADAM17
SCHEMBL22821274 0.82 MAOB (0.52) MAOAMAOBMMP2MMP9ADAM17

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7615332-B2 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process CANON KABUSHIKI KAISHA (JP) 2009-11-10 US disclosed
US-20090233232-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS CANON KABUSHIKI KAISHA (JP) 2009-09-17 US disclosed
EP-1956430-A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process Canon Kabushiki Kaisha (JP) 2008-08-13 EP disclosed
US-20080187864-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS CANON KABUSHIKI KAISHA (JP) 2008-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090233232-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS FRG1, PAH, RER1 MAOA 1322/4885MAOB 1047/4885MMP2 4734/4885
US-20080187864-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS FRG1, PAH, RER1 MAOA 1322/4885MAOB 1047/4885MMP2 4734/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.