Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | PEPD | P12955 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL194104 | 0.97 | TSHR (0.50) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL12192405 | 0.95 | TSHR (0.53) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL73761 | 0.94 | THRB (0.46) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL14473517 | 0.94 | THRB (0.46) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL422679 | 0.94 | TSHR (0.51) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL11618530 | 0.91 | TSHR (0.41) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL75023 | 0.91 | THRB (0.46) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL422110 | 0.91 | TSHR (0.56) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL16466670 | 0.88 | TSHR (0.46) | TSHRTHRBHTTPOLBAPEX1 | |
| SCHEMBL208911 | 0.87 | THRB (0.52) | TSHRTHRBHTTPOLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 219 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103454858-B | Color filter photosensitive coloring composition and color filter | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2016-03-09 | — | — | CN | claimed |
| EP-4400223-A1 | DIGITAL EMBOSSING CREATION METHOD | Sakata INX Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| EP-4397726-A1 | PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING | Sakata INX Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20240218195-A1 | ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND PRINTED MATTER OBTAINED BY PRINTING WITH ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION | SAKATA INX CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| WO-2024095560-A1 | INK COMPOSITION FOR BLOCKING UV RAYS, AND METHOD FOR PRODUCING SUBSTRATE HAVING EMBOSSED SURFACE USING SAME | サカタインクス株式会社 | 2024-05-10 | — | — | WO | disclosed |
| EP-4365250-A1 | MIGRATION-PREVENTING COATING AGENT | Sakata INX Corporation (JP) | 2024-05-08 | — | — | EP | disclosed |
| WO-2024089979-A1 | POWDER DEPOSITION PRINTING METHOD | サカタインクス株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024075386-A1 | ACTIVE ENERGY RAY-CURABLE INK COMPOSITION FOR SURFACE PRINTING | サカタインクス株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2024053298-A1 | ACTIVE ENERGY RAY CURING-TYPE ANTIFOGGING COATING COMPOSITION, CURED MATERIAL, AND LAMINATE | DIC株式会社 | 2024-03-14 | — | — | WO | disclosed |
| WO-2024047976-A1 | PHOTOCURABLE INK-JET INK COMPOSITION | サカタインクス株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2004050653-A2 | OXIME ESTER PHOTOINITIATORS WITH HETEROAROMATIC GROUPS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-06-17 | — | — | WO | disclosed |
| US-20030212162-A1 | Photopolymerization using photoinitiators | TOYO INK MFG. CO., LTD. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-6602643-B2 | Useful as a protective material for etching, as back-coating material in the production of a shadow mask | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2003-08-05 | — | — | US | disclosed |
| US-6576409-B2 | Comprising a resinous compound of an acid-decomposing ester of a monovinyl ether, a (meth)acrylic ester capable of forming a carboxylic acid via decomposition by the action of an acid, an acid generator and a polymerization inhibitor | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20020146629-A1 | Ultraviolet-curable resin composition | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2002-10-10 | — | — | US | disclosed |
| US-20020102501-A1 | Photosensitive resin composition and method for formation of resist pattern by use thereof | ICHIKAWA MIYAKO (JP) | 2002-08-01 | — | — | US | disclosed |
| EP-1219680-A1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION | Taiyo Ink Manufacturing Co. Ltd (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6338936-B1 | RESIN WITH ESTER GROUP, UNSATURATED BOND, GENERATION OF ACID BY EXPOSURE TO ACID AND CATALYSIS | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-6143803-A | PROTECTION WITH CURABLE FILM AND ETCHING | TOAGOSEI CO., LTD. (JP) | 2000-11-07 | — | — | US | disclosed |
| US-5336574-A | Secondary etch resist material containing a compound with a (meth)acryloyl and a carboxy group and another with two or more (meth)acryloyl groups, along with a leveling agent and a chain transfer agent and/or a photoinitiator | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-08-09 | — | — | US | disclosed |