SCHEMBL4235325

SCHEMBL4235325

CCOc1ccc([SiH3])c(C)c1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 10/20 0.41
▸ HTT P42858 2/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ MCOLN3 Q8TDD5 1/20 0.41
▸ KDM4E B2RXH2 6/20 0.41
▸ L3MBTL1 Q9Y468 6/20 0.40
▸ MAPT P10636 6/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ HSD17B10 Q99714 4/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ HPGD P15428 3/20 0.37
▸ GLA P06280 1/20 0.37
▸ NQO1 P15559 1/20 0.37
▸ LMNA P02545 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ AOC3 Q16853 2/20 0.35
▸ POLB P06746 2/20 0.35
▸ RAB9A P51151 2/20 0.34
▸ NPC1 O15118 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3656960 0.88 ALDH1A1 (0.46) ALDH1A1HTTMEN1KMT2AMCOLN3
SCHEMBL20580255 0.83 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AKDM4EL3MBTL1
SCHEMBL158540 0.78 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AKDM4EL3MBTL1
SCHEMBL19121394 0.77 ALDH1A1 (0.44) ALDH1A1HTTMEN1KMT2AMCOLN3
Ammonia Solution, Strong SCHEMBL28224951 0.76 ALDH1A1 (0.42) ALDH1A1HTTMEN1KMT2AMCOLN3
SCHEMBL22371477 0.75 KDM4E (0.42) ALDH1A1KDM4EL3MBTL1MAPTMAPK1
SCHEMBL4241468 0.75 ACHE (0.41) ALDH1A1MEN1KMT2AKDM4EL3MBTL1
SCHEMBL12476303 0.74 ESR1 (0.47) ALDH1A1HTTMEN1KMT2AMCOLN3
SCHEMBL28353697 0.74 ALDH1A1 (0.46) ALDH1A1HTTMEN1KMT2AMCOLN3
SCHEMBL12180442 0.74 ALDH1A1 (0.45) ALDH1A1HTTMEN1KMT2AMCOLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 191 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11142867-B2 Soil-resistant, stain-resistant fluorine-free coatings and methods of applying on materials UNIVERSITY OF HOUSTON SYSTEM (US) 2021-10-12 — — US claimed
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2021-04-27 — — US claimed
EP-3218438-B1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIV HOUSTON SYSTEM (US) 2020-12-16 — — EP claimed
WO-2019182513-A1 A WATERPROOFING FORMULATION AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2019-09-26 — — WO claimed
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VERSUM MATERIALS US, LLC (US) 2019-06-20 — — US claimed
US-20170335508-A1 SOIL-RESISTANT, STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON TEXTILE OR OTHER FLEXIBLE MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-23 — — US claimed
US-20170313888-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-02 — — US claimed
US-20170314189-A1 SOIL-RESISTANT, STAIN-RESISTANT FLUORINE-FREE COATINGS AND METHODS OF APPLYING ON MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-02 — — US claimed
EP-3218540-A1 SOIL-RESISTANT, STAIN-RESISTANT FLUORINE-FREE COATINGS AND METHODS OF APPLYING ON MATERIALS The University Of Houston System (US) 2017-09-20 — — EP claimed
EP-3218438-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS The University Of Houston System (US) 2017-09-20 — — EP claimed
EP-3218541-A1 SOIL-RESISTANT, STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON TEXTILE OR OTHER FLEXIBLE MATERIALS The University Of Houston System (US) 2017-09-20 — — EP claimed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 — — US claimed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 — — US claimed
WO-2016077573-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIVERSITY OF HOUSTON SYSTEM (US) 2016-05-19 — — WO claimed
US-9181399-B2 Method for producing polysiloxane TOAGOSEI CO., LTD. (JP) 2015-11-10 — — US claimed
US-20140323677-A1 THERMAL-SHOCK-RESISTANT CURED PRODUCT AND METHOD FOR PRODUCING SAME TOAGOSEI CO., LTD. (JP) 2014-10-30 — — US claimed
US-20140303392-A1 METHOD FOR PRODUCING POLYSILOXANE TOAGOSEI CO., LTD. (JP) 2014-10-09 — — US claimed
US-20130295779-A1 HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC 2013-11-07 — — US claimed
EP-2650399-A2 High temperature atomic layer deposition of silicon oxide thin films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-16 — — EP claimed
WO-2026105442-A1 COATING FILM, ELECTRONIC DEVICE, MOBILE BODY, AND COATING LIQUID ハドラスホールディングス株式会社 2026-05-21 — — WO disclosed
US-20260118791-A1 TONER CANON KK (JP) 2026-04-30 — — US disclosed
EP-4086705-B1 TONER CANON KK (JP) 2026-03-25 — — EP disclosed
EP-4711423-A1 COATING FILM Hardolass Holdings Co.,Ltd. (JP) 2026-03-18 — — EP disclosed
US-12559632-B2 Weather-resistant, fungal-resistant, and stain-resistant coatings and methods of applying on wood, masonry, or other porous materials UNIVERSITY OF HOUSTON SYSTEM (US) 2026-02-24 — — US disclosed
EP-4012501-B1 EXTERNAL ADDITIVE FOR TONER, TONER AND IMAGE FORMING APPARATUS CANON KK (JP) 2026-02-11 — — EP disclosed
US-12487539-B2 Fine particle, external additive for toners, and toner CANON KABUSHIKI KAISHA (JP) 2025-12-02 — — US disclosed
US-20250334892-A1 FINE POWDER FOR TONER AND TONER CANON KK (JP) 2025-10-30 — — US disclosed
US-12360470-B2 External additive for toner, toner and image forming apparatus CANON KABUSHIKI KAISHA (JP) 2025-07-15 — — US disclosed
US-12353167-B2 External additive for toner and toner CANON KABUSHIKI KAISHA (JP) 2025-07-08 — — US disclosed
US-12312534-B2 Treating fluid comprising hydrocarbons, water, and polymer CHEVRON U.S.A. INC. (US) 2025-05-27 — — US disclosed
WO-2025074948-A1 COATING FILM ハドラスホールディングス株式会社 2025-04-10 — — WO disclosed
US-12222677-B2 Fine particle, external additive for toner, toner, two-component developer, and method for manufacturing toner CANON KABUSHIKI KAISHA (JP) 2025-02-11 — — US disclosed
US-12215276-B2 Ph control in fluid treatment CHEVRON U.S.A. INC. (US) 2025-02-04 — — US disclosed
WO-2024257682-A1 COATING METHOD AND PAINTING METHOD ハドラスホールディングス株式会社 2024-12-19 — — WO disclosed
WO-2024253090-A1 ORGANIC/INORGANIC HYBRID COATING FILM AND COATING LIQUID ハドラスホールディングス株式会社 2024-12-12 — — WO disclosed
WO-2024253089-A1 INORGANIC COATING FILM AND COATING LIQUID ハドラスホールディングス株式会社 2024-12-12 — — WO disclosed
US-12140906-B2 External additive for toner and toner CANON KABUSHIKI KAISHA (JP) 2024-11-12 — — US disclosed
US-12055889-B2 Toner CANON KABUSHIKI KAISHA (JP) 2024-08-06 — — US disclosed
CN-113072072-B Silicon carbide material based on polysilocarb, application and device 帕里杜斯有限公司 2024-07-02 — — CN disclosed
CN-111381467-B Toner and method for producing toner 佳能株式会社 2024-06-14 — — CN disclosed
CN-111381470-B Toner and method for producing the same 佳能株式会社 2024-05-24 — — CN disclosed
US-20240158904-A1 UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF TOAGOSEI CO., LTD. (JP) 2024-05-16 — — US disclosed
US-11981828-B2 Water repellent and oil repellent film composition and use thereof TOAGOSEI CO. LTD. (JP) 2024-05-14 — — US disclosed
CN-111381461-B Toner and method for producing the same 佳能株式会社 2024-04-23 — — CN disclosed
CN-111381462-B Toner and method for producing the same 佳能株式会社 2024-04-16 — — CN disclosed
US-11934147-B2 Toner CANON KABUSHIKI KAISHA (JP) 2024-03-19 — — US disclosed
EP-3743464-B1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF BRONX CREATIVE&DESIGN CENTRE PTE LTD (SG) 2024-03-06 — — EP disclosed
US-20240067865-A1 TREATING FLUID COMPRISING HYDROCARBONS, WATER, AND POLYMER CHEVRON U.S.A. INC. 2024-02-29 — — US disclosed
US-20240061356-A1 FINE PARTICLE, EXTERNAL ADDITIVE FOR TONERS, AND TONER CANON KABUSHIKI KAISHA (JP) 2024-02-22 — — US disclosed
EP-3674800-B1 TONER AND METHOD FOR PRODUCING TONER CANON KK (JP) 2024-02-14 — — EP disclosed
CN-115103872-B Silsesquioxane derivative and use thereof 东亚合成株式会社 2024-02-02 — — CN disclosed
EP-4289618-A1 UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME Toagosei Co., Ltd. (JP) 2023-12-13 — — EP disclosed
US-11834606-B2 Treating fluid comprising hydrocarbons, water, and polymer CHEVRON U.S.A. INC. (US) 2023-12-05 — — US disclosed
US-11809132-B2 Toner CANON KABUSHIKI KAISHA (JP) 2023-11-07 — — US disclosed
CN-112888715-B Silsesquioxane derivative composition and use thereof 东亚合成株式会社 2023-11-03 — — CN disclosed
CN-116897195-A Primer composition for inorganic substance layer lamination, cured product thereof, and method for producing same 东亚合成株式会社 2023-10-17 — — CN disclosed
US-20230323193-A1 PH CONTROL IN FLUID TREATMENT CHEVRON U.S.A. INC. 2023-10-12 — — US disclosed
CN-116610012-A Fine particles containing silicon and toner 佳能株式会社 2023-08-18 — — CN disclosed
US-20230257526-A1 FINE PARTICLE CONTAINING SILICON AND TONER CANON KABUSHIKI KAISHA (JP) 2023-08-17 — — US disclosed
US-20230250250-A1 Organic-inorganic Aerogel Composites, Methods and Uses Thereof BRONX CREATIVE & DESIGN CENTRE PTE LTD (SG) 2023-08-10 — — US disclosed
US-11675283-B2 Magnetic carrier, two-component developer, and method for producing magnetic carrier CANON KABUSHIKI KAISHA (JP) 2023-06-13 — — US disclosed
US-20230128852-A1 SILSESQUIOXANE DERIVATIVE AND USE THEREOF TOAGOSEI CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230086689-A1 FINE PARTICLE, EXTERNAL ADDITIVE FOR TONERS, AND TONER CANON KABUSHIKI KAISHA (JP) 2023-03-23 — — US disclosed
CN-115774380-A Fine particles, external additive for toner, and toner 佳能株式会社 2023-03-10 — — CN disclosed
US-11599035-B2 Toner CANON KABUSHIKI KAISHA (JP) 2023-03-07 — — US disclosed
US-11591893-B2 PH control in fluid treatment CHEVRON U.S.A. INC. (US) 2023-02-28 — — US disclosed
CN-115594508-A Silicon carbide space shapes and methods of forming spheroids 帕里杜斯有限公司(US) 2023-01-13 — — CN disclosed
EP-4086705-A1 TONER CANON KABUSHIKI KAISHA (JP) 2022-11-09 — — EP disclosed
CN-111065614-B Silicon carbide space shapes and methods of forming spheroids 帕里杜斯有限公司 2022-11-04 — — CN disclosed
CN-115103872-A Silsesquioxane derivative and use thereof 东亚合成株式会社 2022-09-23 — — CN disclosed
US-20220259442-A1 Weather-Resistant, Fungal-Resistant, And Stain-Resistant Coatings And Methods Of Applying On Wood, Masonry, Or Other Porous Materials UNIVERSITY OF HOUSTON SYSTEM (US) 2022-08-18 — — US disclosed
WO-2022168804-A1 UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME 東亞合成株式会社 2022-08-11 — — WO disclosed
EP-4036653-A2 EXTERNAL ADDITIVE FOR TONER AND TONER CANON KABUSHIKI KAISHA (JP) 2022-08-03 — — EP disclosed
EP-4036652-A2 EXTERNAL ADDITIVE FOR TONER AND TONER CANON KABUSHIKI KAISHA (JP) 2022-08-03 — — EP disclosed
US-20220236656-A1 EXTERNAL ADDITIVE FOR TONER AND TONER CANON KABUSHIKI KAISHA (JP) 2022-07-28 — — US disclosed
US-20220236654-A1 FINE PARTICLE, EXTERNAL ADDITIVE FOR TONER, TONER, TWO-COMPONENT DEVELOPER, AND METHOD FOR MANUFACTURING TONER CANON KABUSHIKI KAISHA (JP) 2022-07-28 — — US disclosed
US-20220236655-A1 EXTERNAL ADDITIVE FOR TONER AND TONER CANON KABUSHIKI KAISHA (JP) 2022-07-28 — — US disclosed
EP-3577177-B1 TRANSPARENT, SCRATCH RESISTANT LAYER WITH ANTIFOULING PROPERTIES AND PROCESS FOR ITS PREPARATION FACHHOCHSCHULE KIEL (DE) 2022-07-27 — — EP disclosed
CN-114791694-A External additive for toner and toner 佳能株式会社 2022-07-26 — — CN disclosed
CN-114791693-A External additive for toner and toner 佳能株式会社 2022-07-26 — — CN disclosed
EP-3674804-B1 TONER CANON KK (JP) 2022-06-29 — — EP disclosed
EP-3674806-B1 TONER CANON KK (JP) 2022-06-22 — — EP disclosed
US-20220187728-A1 EXTERNAL ADDITIVE FOR TONER, TONER AND IMAGE FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-06-16 — — US disclosed
EP-4012501-A1 EXTERNAL ADDITIVE FOR TONER, TONER AND IMAGE FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-06-15 — — EP disclosed
CN-114624971-A External additive for toner, and image forming apparatus 佳能株式会社 2022-06-14 — — CN disclosed
US-11360404-B2 Toner and method for producing toner CANON KABUSHIKI KAISHA (JP) 2022-06-14 — — US disclosed
EP-3674799-B1 TONER CANON KK (JP) 2022-06-08 — — EP disclosed
US-11345821-B2 Weather-resistant, fungal-resistant, and stain-resistant coatings and methods of applying on wood, masonry, or other porous materials UNIVERSITY OF HOUSTON SYSTEM (US) 2022-05-31 — — US disclosed
US-20220145157-A1 TREATING FLUID COMPRISING HYDROCARBONS, WATER, AND POLYMER CHEVRON U.S.A. INC. 2022-05-12 — — US disclosed
US-11242739-B2 Treating fluid comprising hydrocarbons, water, and polymer CHEVRON U.S.A. INC. (US) 2022-02-08 — — US disclosed
WO-2021261133-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING CURED PRODUCT 東亞合成株式会社 2021-12-30 — — WO disclosed
US-20210395602-A1 PH CONTROL IN FLUID TREATMENT CHEVRON U.S.A. INC. 2021-12-23 — — US disclosed
CN-113603066-A Preparation technology of ultra-pure silicon carbide powder applied to semiconductor field 北京纳斯特克纳米科技有限责任公司 2021-11-05 — — CN disclosed
US-20210318630-A1 TONER CANON KABUSHIKI KAISHA (JP) 2021-10-14 — — US disclosed
US-11142867-B2 Soil-resistant, stain-resistant fluorine-free coatings and methods of applying on materials UNIVERSITY OF HOUSTON SYSTEM (US) 2021-10-12 — — US disclosed
US-20210302856-A1 TONER CANON KABUSHIKI KAISHA (JP) 2021-09-30 — — US disclosed
US-20210294238-A1 TONER CANON KABUSHIKI KAISHA (JP) 2021-09-23 — — US disclosed
US-20210286283-A1 TONER CANON KABUSHIKI KAISHA (JP) 2021-09-16 — — US disclosed
US-20210286281-A1 TONER CANON KABUSHIKI KAISHA (JP) 2021-09-16 — — US disclosed
CN-109031903-B Toner and image forming apparatus 佳能株式会社 2021-09-14 — — CN disclosed
US-20210238445-A1 WATER REPELLENT AND OIL REPELLENT FILM COMPOSITION AND USE THEREOF TOAGOSEI CO. LTD. (JP) 2021-08-05 — — US disclosed
WO-2021153683-A1 SILSESQUIOXANE DERIVATIVE AND USE THEREFOR 東亞合成株式会社 2021-08-05 — — WO disclosed
CN-113072072-A Silicon carbide materials based on polysilocarb, applications and devices 帕里杜斯有限公司 2021-07-06 — — CN disclosed
CN-112888715-A Silsesquioxane derivative composition and use thereof 东亚合成株式会社 2021-06-01 — — CN disclosed
US-20210141315-A1 MAGNETIC CARRIER, TWO-COMPONENT DEVELOPER, AND METHOD FOR PRODUCING MAGNETIC CARRIER CANON KABUSHIKI KAISHA (JP) 2021-05-13 — — US disclosed
US-10996577-B2 Toner CANON KABUSHIKI KAISHA (JP) 2021-05-04 — — US disclosed
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2021-04-27 — — US disclosed
US-10983450-B2 Toner CANON KABUSHIKI KAISHA (JP) 2021-04-20 — — US disclosed
US-10983451-B2 Toner CANON KABUSHIKI KAISHA (JP) 2021-04-20 — — US disclosed
CN-107108234-B Silicon carbide materials based on polysilocarb, applications and devices 梅里奥创新公司 2021-04-20 — — CN disclosed
US-10916437-B2 Methods of forming micropatterns and substrate processing apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-02-09 — — US disclosed
EP-3218438-B1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIV HOUSTON SYSTEM (US) 2020-12-16 — — EP disclosed
EP-3743464-A1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF Bronx Creative&Design Centre Pte Ltd (SG) 2020-12-02 — — EP disclosed
CN-111381467-A Toner and method for producing toner 佳能株式会社 2020-07-07 — — CN disclosed
CN-111381461-A Toner and image forming apparatus 佳能株式会社 2020-07-07 — — CN disclosed
CN-111381462-A Toner and image forming apparatus 佳能株式会社 2020-07-07 — — CN disclosed
CN-111381470-A Toner and image forming apparatus 佳能株式会社 2020-07-07 — — CN disclosed
US-10704191-B2 Soil-resistant, stain-resistant coatings and methods of applying on textile or other flexible materials UNIVERSITY OF HOUSTON SYSTEM (US) 2020-07-07 — — US disclosed
US-20200209770-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-02 — — US disclosed
US-20200209768-A1 TONER AND METHOD FOR PRODUCING TONER CANON KABUSHIKI KAISHA (JP) 2020-07-02 — — US disclosed
US-20200209771-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-02 — — US disclosed
US-20200209769-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-02 — — US disclosed
EP-3674799-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-01 — — EP disclosed
EP-3674800-A1 TONER AND METHOD FOR PRODUCING TONER CANON KABUSHIKI KAISHA (JP) 2020-07-01 — — EP disclosed
EP-3674806-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-01 — — EP disclosed
EP-3674804-A1 TONER CANON KABUSHIKI KAISHA (JP) 2020-07-01 — — EP disclosed
CN-111065614-A Silicon carbide space shapes and methods of forming spheroids 帕里杜斯有限公司 2020-04-24 — — CN disclosed
US-20200123889-A1 TREATING FLUID COMPRISING HYDROCARBONS, WATER, AND POLYMER CHEVRON U.S.A. INC. 2020-04-23 — — US disclosed
CN-105745299-B High strength low density synthetic proppant for hydraulic fracturing and recovery of hydrocarbons 美利尔创新公司 2020-03-13 — — CN disclosed
WO-2019182513-A1 A WATERPROOFING FORMULATION AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2019-09-26 — — WO disclosed
WO-2019147183-A1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF BRONX CREATIVE & DESIGN CENTRE PTE LTD (SG) 2019-08-01 — — WO disclosed
US-20190198342-A1 Methods of Forming Micropatterns and Substrate Processing Apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-27 — — US disclosed
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VERSUM MATERIALS US, LLC (US) 2019-06-20 — — US disclosed
US-10259911-B2 Addition curable resin composition and semiconductor package SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-16 — — US disclosed
US-10242864-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2019-03-26 — — US disclosed
US-10179840-B2 Condensation curable resin composition and semiconductor package SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-15 — — US disclosed
US-20180235207-A1 PESTICIDE RETENTION COATING COMPOSITIONS AND USES THEREOF INTEGRICOTE, INC. (US) 2018-08-23 — — US disclosed
WO-2018141832-A1 TRANSPARENT SCRATCH-RESISTANT LAYER HAVING ANTI-FOULING PROPERTIES AND METHOD FOR PRODUCING SAME FACHHOCHSCHULE KIEL (DE) 2018-08-09 — — WO disclosed
EP-3187554-B1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE SHINETSU CHEMICAL CO (JP) 2018-07-25 — — EP disclosed
EP-3239247-B1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE SHINETSU CHEMICAL CO (JP) 2018-07-18 — — EP disclosed
US-9939727-B2 Method for manufacturing patterned object, patterned object, and light irradiation apparatus USHIO DENKI KABUSHIKI KAISHA (JP) 2018-04-10 — — US disclosed
US-9887080-B2 Method of forming SiOCN material layer and method of fabricating semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-02-06 — — US disclosed
US-20170335508-A1 SOIL-RESISTANT, STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON TEXTILE OR OTHER FLEXIBLE MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-23 — — US disclosed
US-20170313888-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-02 — — US disclosed
US-20170314189-A1 SOIL-RESISTANT, STAIN-RESISTANT FLUORINE-FREE COATINGS AND METHODS OF APPLYING ON MATERIALS UNIVERSITY OF HOUSTON SYSTEM 2017-11-02 — — US disclosed
EP-3239247-A1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE Shin-Etsu Chemical Co., Ltd. (JP) 2017-11-01 — — EP disclosed
US-20170306098-A1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-26 — — US disclosed
EP-3218540-A1 SOIL-RESISTANT, STAIN-RESISTANT FLUORINE-FREE COATINGS AND METHODS OF APPLYING ON MATERIALS The University Of Houston System (US) 2017-09-20 — — EP disclosed
EP-3218541-A1 SOIL-RESISTANT, STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON TEXTILE OR OTHER FLEXIBLE MATERIALS The University Of Houston System (US) 2017-09-20 — — EP disclosed
EP-3218438-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS The University Of Houston System (US) 2017-09-20 — — EP disclosed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 — — US disclosed
EP-3214144-A1 ADDITION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE Shin-Etsu Chemical Co., Ltd. (JP) 2017-09-06 — — EP disclosed
US-9751989-B2 Condensation curable resin composition and semiconductor package SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-05 — — US disclosed
EP-3187554-A1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE Shin-Etsu Chemical Co., Ltd. (JP) 2017-07-05 — — EP disclosed
US-20170186603-A1 METHOD OF FORMING SiOCN MATERIAL LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-06-29 — — US disclosed
US-20170174843-A1 CONDENSATION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-22 — — US disclosed
US-20170174844-A1 ADDITION CURABLE RESIN COMPOSITION AND SEMICONDUCTOR PACKAGE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-22 — — US disclosed
US-9663598-B2 Organosilicon compound-containing thermosetting composition and cured product thereof TOAGOSEI CO., LTD. (JP) 2017-05-30 — — US disclosed
US-9645518-B2 Toner CANON KABUSHIKI KAISHA (JP) 2017-05-09 — — US disclosed
US-9632441-B2 Toner CANON KABUSHIKI KAISHA (JP) 2017-04-25 — — US disclosed
EP-2860584-B1 Toner CANON KK (JP) 2017-04-05 — — EP disclosed
WO-2017031289-A1 PESTICIDE RETENTION COATING COMPOSITIONS AND USES THEREOF INTEGRICOTE, INC. (US) 2017-02-23 — — WO disclosed
US-20170052447-A1 METHOD FOR MANUFACTURING PATTERNED OBJECT, PATTERNED OBJECT, AND LIGHT IRRADIATION APPARATUS USHIO DENKI KABUSHIKI KAISHA (JP) 2017-02-23 — — US disclosed
US-20160378003-A1 MAGNETIC TONER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2016-12-29 — — US disclosed
US-9529289-B2 Method for producing toner particles CANON KABUSHIKI KAISHA (JP) 2016-12-27 — — US disclosed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 — — US disclosed
US-9460912-B2 High temperature atomic layer deposition of silicon oxide thin films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-10-04 — — US disclosed
US-20160200842-A1 ORGANOSILICON COMPOUND-CONTAINING THERMOSETTING COMPOSITION AND CURED PRODUCT THEREOF TOAGOSEI CO., LTD. (JP) 2016-07-14 — — US disclosed
WO-2016077573-A1 WEATHER-RESISTANT, FUNGAL-RESISTANT, AND STAIN-RESISTANT COATINGS AND METHODS OF APPLYING ON WOOD, MASONRY, OR OTHER POROUS MATERIALS UNIVERSITY OF HOUSTON SYSTEM (US) 2016-05-19 — — WO disclosed
US-20150378275-A1 METHOD FOR PRODUCING TONER PARTICLES CANON KABUSHIKI KAISHA (JP) 2015-12-31 — — US disclosed
US-20150378274-A1 TONER CANON KABUSHIKI KAISHA (JP) 2015-12-31 — — US disclosed
US-9181399-B2 Method for producing polysiloxane TOAGOSEI CO., LTD. (JP) 2015-11-10 — — US disclosed
EP-2860584-A1 Toner Canon Kabushiki Kaisha (JP) 2015-04-15 — — EP disclosed
US-20150099224-A1 TONER CANON KABUSHIKI KAISHA (JP) 2015-04-09 — — US disclosed
US-20140323677-A1 THERMAL-SHOCK-RESISTANT CURED PRODUCT AND METHOD FOR PRODUCING SAME TOAGOSEI CO., LTD. (JP) 2014-10-30 — — US disclosed
US-20140303392-A1 METHOD FOR PRODUCING POLYSILOXANE TOAGOSEI CO., LTD. (JP) 2014-10-09 — — US disclosed
US-8771642-B2 Active particles for bio-analytical applications and methods for their preparation Alma Mater Studiorum—Universita' di Bologna (IT) 2014-07-08 — — US disclosed
US-8771642-B2 Active particles for bio-analytical applications and methods for their preparation Alma Mater Studiorum—Universita' di Bologna (IT) 2014-07-08 — — US disclosed
US-20130295779-A1 HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC 2013-11-07 — — US disclosed
EP-2650399-A2 High temperature atomic layer deposition of silicon oxide thin films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-16 — — EP disclosed
US-20110274621-A1 Active Particles for Bio-Analytical Applications and Methods for Their Preparation ALMA MATER STUDIORUM-UNIVERSITA'DI BOLOGNA (IT) 2011-11-10 — — US disclosed
US-20110262356-A1 Active Particles for Bio-Analytical Applications and Methods for Preparation Thereof CYANAGEN S.R.L. (IT) 2011-10-27 — — US disclosed
US-20110098370-A1 SULFONATED POLY 2-(PHENYL ETHYL) SILOXANE POLYMER ELECTROLYTE MEMBRANES UNIVERSITY OF ONTARIO INSTITUTE OF TECHNOLOGY (CA) 2011-04-28 — — US disclosed
US-20090326097-A1 SURFACE-COATED ALUMINUM OXIDE NANOPARTICLE AND RESIN COMPOSITION THEREOF NISSAN MOTOR CO., LTD. 2009-12-31 — — US disclosed
EP-2048189-A1 SURFACE-COATED ALUMINUM OXIDE NANOPARTICLE AND RESIN COMPOSITION THEREOF Nissan Motor Co., Ltd. (JP) 2009-04-15 — — EP disclosed
US-4613451-A SELF-CURING COATING PPG INDUSTRIES, INC. (US) 1986-09-23 — — US disclosed
US-4599393-A Method for polymerizing lactams and products obtained therefrom GENERAL ELECTRIC COMPANY (US) 1986-07-08 — — US disclosed
US-4501872-A FILMS; COATINGS; SELF-CURING AT LOW TEMPERATURES PPG INDUSTRIES, INC. (US) 1985-02-26 — — US disclosed
US-4467081-A Gelable, silicate rich resins from hydrophobic polyols and volatile and/or incompatible organosilicates PPG INDUSTRIES, INC. (US) 1984-08-21 — — US disclosed
US-4446292-A Moisture curable compositions containing reaction products of hydrophobic polyols and monomer organosilicon-containing substances PPG INDUSTRIES, INC. (US) 1984-05-01 — — US disclosed
US-4413086-A Coating compositions containing organosilane-polyol PPG INDUSTRIES, INC. (US) 1983-11-01 — — US disclosed
US-4413086-A Coating compositions containing organosilane-polyol PPG INDUSTRIES, INC. (US) 1983-11-01 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12559632-B2 Weather-resistant, fungal-resistant, and stain-resistant coatings and methods of applying on wood, masonry, or other porous materials GMDS, MGAM, STS ALDH1A1 4200/4885HTT 2836/4885MEN1 27/4885
US-20110262356-A1 Active Particles for Bio-Analytical Applications and Methods for Preparation Thereof PHOSPHO1, EPX, PGLS ALDH1A1 1625/4885HTT 2245/4885MEN1 451/4885
US-20180235207-A1 PESTICIDE RETENTION COATING COMPOSITIONS AND USES THEREOF DDT, ACHE, CAPG ALDH1A1 2893/4885HTT 340/4885MEN1 1765/4885
US-10242864-B2 High temperature atomic layer deposition of silicon oxide thin films SCN4A, RTN3, RPS4X ALDH1A1 2635/4885HTT 3154/4885MEN1 223/4885
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VIM, CDH1, ALDOA ALDH1A1 633/4885HTT 2543/4885MEN1 2378/4885
US-20110274621-A1 Active Particles for Bio-Analytical Applications and Methods for Their Preparation PHOSPHO1, LIPA, ALG1 ALDH1A1 1297/4885HTT 482/4885MEN1 294/4885
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VIM, CDH1, ALDOA ALDH1A1 633/4885HTT 2543/4885MEN1 2378/4885
US-20260118791-A1 TONER MSR1, H1-2, TAAR1 ALDH1A1 2569/4885HTT 1951/4885MEN1 2066/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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