Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Ethoxyamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethoxyamine SCHEMBL31471 | 0.95 | — | — | |
| Ethoxyamine SCHEMBL8021795 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28136292 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL27930346 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28598862 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28425226 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28228452 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28176828 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL38077 | 0.90 | — | — | |
| Ethoxyamine SCHEMBL28307040 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110506100-A | Composite and application method after chemical mechanical grinding | ENTEGRIS INC | 2019-11-26 | — | — | CN | claimed |
| CN-110152653-A | A kind of hollow Nano tubulose manganese-based low-temperature denitration catalyst and preparation method thereof | 南京师范大学 | 2019-08-23 | — | — | CN | claimed |
| CN-110004449-A | Cleaning solution, preparation method and application after stable type chemically mechanical polishing | 上海新阳半导体材料股份有限公司 | 2019-07-12 | — | — | CN | claimed |
| CN-109988675-A | Cleaning solution, preparation method and application after long-acting type chemically mechanical polishing | 上海新阳半导体材料股份有限公司 | 2019-07-09 | — | — | CN | claimed |
| CN-109988676-A | A kind of cleaning solution, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-07-09 | — | — | CN | claimed |
| CN-109939977-A | Resin mask removes cleaning method | 花王株式会社 | 2019-06-28 | — | — | CN | claimed |
| CN-105739262-B | Electrophotography component and its production method, handle box and electronic photographing device | 佳能株式会社 | 2018-12-25 | — | — | CN | claimed |
| CN-106283097-B | Cleaning liquid composition | 易安爱富科技有限公司 | 2018-12-04 | — | — | CN | claimed |
| CN-108697695-A | Treat the pharmaceutical composition of respiratory disease | 中国科学院昆明植物研究所 | 2018-10-23 | — | — | CN | claimed |
| CN-106147748-B | A kind of CdSeTe@SiO2Core-shell nano material and preparation method thereof | 南京大学 | 2018-08-28 | — | — | CN | claimed |
| CN-108160041-A | A kind of sulfide in gas deep absorption desulfurization agent and preparation method | 中国石油大学(华东) | 2018-06-15 | — | — | CN | claimed |
| CN-107636201-A | Corrosion inhibitor preparation | 罗地亚经营管理公司 | 2018-01-26 | — | — | CN | claimed |
| CN-106536668-A | Stabilization of tris(2-hydroxyethyl( methylammonium hydroxide against decomposition with dialkyhydroxylamine | 嘉柏微电子材料股份公司 | 2017-03-22 | — | — | CN | claimed |
| CN-106353976-A | Cleaning composition for lithography and method for forming photoresist pattern using the same | 荣昌化学制品株式会社 | 2017-01-25 | — | — | CN | claimed |
| CN-106283097-A | Cleaning liquid composition | 易安爱富科技有限公司 | 2017-01-04 | — | — | CN | claimed |
| CN-105739262-A | MEMBER FOR ELECTROPHOTOGRAPHY AND METHOD OF PRODUCING THE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | 佳能株式会社 | 2016-07-06 | — | — | CN | claimed |
| CN-102959691-A | Liquid composition for cleaning semiconductor substrate and method for cleaning semiconductor substrate using same | MITSUBISHI GAS CHEMICAL CO | 2013-03-06 | — | — | CN | claimed |
| CN-101842872-A | Compound for stripping photoresist | EKC TECHNOLOGY INC | 2010-09-22 | — | — | CN | claimed |
| CN-101371339-A | Chemical mechanical polishing composition for step II copper liners and other related materials and method of using same | ADVANCED TECH MATERIALS (US) | 2009-02-18 | — | — | CN | claimed |
| CN-106573231-B | Hydrogenation catalyst and process for producing the same | 陈志勇 | 2019-12-03 | — | — | CN | disclosed |
| CN-110506100-A | Composite and application method after chemical mechanical grinding | ENTEGRIS INC | 2019-11-26 | — | — | CN | disclosed |
| CN-110470710-A | A kind of preparation and test method of magnetoelectric composites | UNIV XIAN POLYTECHNIC | 2019-11-19 | — | — | CN | disclosed |
| CN-106892946-B | Biflavone-nickel complex and its preparation method and application | 南京林业大学 | 2019-11-12 | — | — | CN | disclosed |
| CN-106905371-B | Biflavone-manganese complex and its preparation method and application | 南京林业大学 | 2019-11-12 | — | — | CN | disclosed |
| CN-110152653-A | A kind of hollow Nano tubulose manganese-based low-temperature denitration catalyst and preparation method thereof | 南京师范大学 | 2019-08-23 | — | — | CN | disclosed |
| CN-110105697-A | A method of preparing polyelectrolyte complex material | 南京林业大学 | 2019-08-09 | — | — | CN | disclosed |
| CN-110072864-A | TDO2 INHIBITORS | 基因泰克公司 | 2019-07-30 | — | — | CN | disclosed |
| CN-110004449-A | Cleaning solution, preparation method and application after stable type chemically mechanical polishing | 上海新阳半导体材料股份有限公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-109988675-A | Cleaning solution, preparation method and application after long-acting type chemically mechanical polishing | 上海新阳半导体材料股份有限公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-109988676-A | A kind of cleaning solution, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-109988676-A | A kind of cleaning solution, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-109960116-A | Photoresist remover | 弗萨姆材料美国有限责任公司 | 2019-07-02 | — | — | CN | disclosed |
| CN-109939977-A | Resin mask removes cleaning method | 花王株式会社 | 2019-06-28 | — | — | CN | disclosed |
| CN-106883272-B | Biflavone-iron complex and its preparation method and application | 南京林业大学 | 2019-06-18 | — | — | CN | disclosed |
| CN-106883273-B | Biflavone-cobalt complex and its preparation method and application | 南京林业大学 | 2019-06-18 | — | — | CN | disclosed |
| CN-109666156-A | A kind of energy-absorbing method based on hydridization dynamic aggregation compositions | 翁秋梅 | 2019-04-23 | — | — | CN | disclosed |
| CN-109666167-A | A kind of hydridization dynamic aggregation compositions | 翁秋梅 | 2019-04-23 | — | — | CN | disclosed |
| CN-109504094-A | A kind of preparation method of modified black element nano particle | 江南大学 | 2019-03-22 | — | — | CN | disclosed |
| CN-104152297-B | Cleaning combination, the manufacturing method of semiconductor device and cleaning method | 富士胶片株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-109232311-A | A kind of Pregabalin synthetic method of green high-efficient | 浙江新和成股份有限公司 | 2019-01-18 | — | — | CN | disclosed |
| CN-106749344-B | Biflavone-copper complex and its preparation method and application | 南京林业大学 | 2018-12-25 | — | — | CN | disclosed |
| CN-105739262-B | Electrophotography component and its production method, handle box and electronic photographing device | 佳能株式会社 | 2018-12-25 | — | — | CN | disclosed |
| CN-109023370-A | Etching solution and engraving method for copper-molybdenum metallic diaphragm | 深圳市华星光电技术有限公司 | 2018-12-18 | — | — | CN | disclosed |
| CN-105903038-B | A kind of hollow imitated vesicle structure nanocomposite of gadolinium-doped and its preparation and application | 上海师范大学 | 2018-12-11 | — | — | CN | disclosed |
| CN-106283097-B | Cleaning liquid composition | 易安爱富科技有限公司 | 2018-12-04 | — | — | CN | disclosed |
| CN-108884017-A | Etheramines based on 1, 3-diols | 巴斯夫欧洲公司 | 2018-11-23 | — | — | CN | disclosed |
| CN-106699779-B | Rufloxacin aldehyde contracting 4- arylamino thiourea derivatives and its preparation method and application | 郑州工业应用技术学院 | 2018-11-09 | — | — | CN | disclosed |
| CN-108779062-A | Polyetheramine based on 1,3- glycol | 巴斯夫欧洲公司 | 2018-11-09 | — | — | CN | disclosed |
| CN-108697695-A | Treat the pharmaceutical composition of respiratory disease | 中国科学院昆明植物研究所 | 2018-10-23 | — | — | CN | disclosed |
| CN-106854206-B | N- methyl Moxifloxacin aldehyde contracting 4- arylamino thiourea derivatives and its preparation method and application | 郑州工业应用技术学院 | 2018-10-12 | — | — | CN | disclosed |
| CN-106674220-B | N- methyl Enoxacin aldehyde contracting 4- arylamino thiourea derivatives and its preparation method and application | 郑州工业应用技术学院 | 2018-10-09 | — | — | CN | disclosed |
| CN-106905353-B | Biflavone-Zn complex and its preparation method and application | 南京林业大学 | 2018-10-09 | — | — | CN | disclosed |
| CN-106147748-B | A kind of CdSeTe@SiO2Core-shell nano material and preparation method thereof | 南京大学 | 2018-08-28 | — | — | CN | disclosed |
| CN-107718587-B | A kind of multifunctional medical conduit and preparation method thereof, application | 沈坤 | 2018-08-14 | — | — | CN | disclosed |
| CN-108379581-A | A kind of ferroso-ferric oxide-carbon-gold pharmaceutical carrier and preparation method thereof | 上海交通大学 | 2018-08-10 | — | — | CN | disclosed |
| CN-108350319-A | slurry for processing tungsten with cationic surfactant | 嘉柏微电子材料股份公司 | 2018-07-31 | — | — | CN | disclosed |
| CN-108160041-A | A kind of sulfide in gas deep absorption desulfurization agent and preparation method | 中国石油大学(华东) | 2018-06-15 | — | — | CN | disclosed |
| CN-105986308-B | Electrolyte composition for removing flash and method for removing flash | 化研科技株式会社 | 2018-04-13 | — | — | CN | disclosed |
| CN-107904267-A | A kind of method using microorganism conversion synthesis parahydroxyben-zaldehyde | 湖南中医药大学 | 2018-04-13 | — | — | CN | disclosed |
| CN-107850859-A | Stripping composition for removing photoresist on semiconductor substrate | 富士胶片电子材料美国有限公司 | 2018-03-27 | — | — | CN | disclosed |
| CN-107636201-A | Corrosion inhibitor preparation | 罗地亚经营管理公司 | 2018-01-26 | — | — | CN | disclosed |
| CN-107548526-A | Organic bath compound for redox flow batteries | 可替代能源CIC研究合作中心基金会 | 2018-01-05 | — | — | CN | disclosed |
| CN-107201082-A | Ink and its production method and ink storage container, printing process and printing equipment | 株式会社理光 | 2017-09-26 | — | — | CN | disclosed |
| CN-107102522-A | Developing member, its production method, handle box and electrophotographic image-forming apparatus | 佳能株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107075067-A | Polyetheramine based on 1,3 glycol | 巴斯夫欧洲公司 | 2017-08-18 | — | — | CN | disclosed |
| CN-107022421-A | The manufacture method of cleaning method and semiconductor device | 富士胶片株式会社 | 2017-08-08 | — | — | CN | disclosed |
| CN-106661518-A | Cleaning composition following CMP and methods related thereto | 嘉柏微电子材料股份公司 | 2017-05-10 | — | — | CN | disclosed |
| CN-103681959-B | Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance | 太阳化学公司 | 2017-04-19 | — | — | CN | disclosed |
| CN-106536668-A | Stabilization of tris(2-hydroxyethyl( methylammonium hydroxide against decomposition with dialkyhydroxylamine | 嘉柏微电子材料股份公司 | 2017-03-22 | — | — | CN | disclosed |
| CN-104245608-B | Method and apparatus for manufacturing optical substrate having uneven pattern using film-like mold, and method for manufacturing device provided with optical substrate | 吉坤日矿日石能源株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106457600-A | Wood preservative composition | 奥麟木材保护有限公司 | 2017-02-22 | — | — | CN | disclosed |
| CN-106353976-A | Cleaning composition for lithography and method for forming photoresist pattern using the same | 荣昌化学制品株式会社 | 2017-01-25 | — | — | CN | disclosed |
| CN-106283097-A | Cleaning liquid composition | 易安爱富科技有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-103855125-B | High heat conducting pattern circuit substrate | 苏州晶品光电科技有限公司 | 2016-11-16 | — | — | CN | disclosed |
| CN-102089317-B | Method for producing nanoparticles | 3M创新有限公司 | 2016-10-19 | — | — | CN | disclosed |
| CN-106030417-A | Photosensitizing chemically amplified resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | 东京毅力科创株式会社 | 2016-10-12 | — | — | CN | disclosed |
| CN-103403845-B | Method for forming capacitor structure and silicon etching liquid used for the same | 富士胶片株式会社 | 2016-08-10 | — | — | CN | disclosed |
| CN-102282682-B | Increase the solution of wafer sheet resistance and/or photovoltaic cell power density level | 安万托特性材料有限公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-105739262-A | MEMBER FOR ELECTROPHOTOGRAPHY AND METHOD OF PRODUCING THE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | 佳能株式会社 | 2016-07-06 | — | — | CN | disclosed |
| CN-103912807-B | Great power LED photo engine | 苏州晶品光电科技有限公司 | 2016-06-15 | — | — | CN | disclosed |
| CN-103872217-B | High-power LED light source packaging body | 苏州晶品光电科技有限公司 | 2016-06-15 | — | — | CN | disclosed |
| CN-103872216-B | High-power LED light source module | 苏州晶品光电科技有限公司 | 2016-06-15 | — | — | CN | disclosed |
| CN-102656671-B | Method for manufacturing semiconductor transistor, driver circuit using semiconductor transistor manufactured by the method, pixel circuit including the driver circuit and display element, display panel in which the pixel circuits are arranged in rows and columns, and display device including the display panel | MATSUSHITA ELECTRIC INDUSTRIAL CO.,LTD. (JP) | 2015-12-02 | — | — | CN | disclosed |
| CN-103912807-A | High power light emitting diode (LED) light engine | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-07-09 | — | — | CN | disclosed |
| CN-103917043-A | Patterned multi-insulating-material circuit substrate | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-07-09 | — | — | CN | disclosed |
| CN-103915547-A | LED light source combination body with high thermal conductivity | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-07-09 | — | — | CN | disclosed |
| CN-103906346-A | Semiconductor device circuit board with high radiating and high thermal conducting characteristics | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-07-02 | — | — | CN | disclosed |
| CN-103872217-A | High-power LED (Light Emitting Diode) light source package body | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-06-18 | — | — | CN | disclosed |
| CN-103872216-A | High-power LED (Light Emitting Diode) light source module | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-06-18 | — | — | CN | disclosed |
| CN-103855125-A | High-heat-conductive patterned circuit baseplate | SUZHOU JINGPIN OPTICAL ELECTRONICAL TECHNOLOGY CO LTD | 2014-06-11 | — | — | CN | disclosed |
| CN-103681959-A | Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance | ROHM & HAAS ELECT MAT | 2014-03-26 | — | — | CN | disclosed |
| CN-102169818-B | Improved method of texturing semiconductor substrates | ROHM & HAAS ELECT MAT | 2013-12-11 | — | — | CN | disclosed |
| CN-103403845-A | Method for forming capacitor structure and silicon etching liquid used for the same | FUJI PHOTO FILM CO LTD | 2013-11-20 | — | — | CN | disclosed |
| CN-102959691-A | Liquid composition for cleaning semiconductor substrate and method for cleaning semiconductor substrate using same | MITSUBISHI GAS CHEMICAL CO | 2013-03-06 | — | — | CN | disclosed |
| CN-102652910-A | Non-ionic surface active agent, and preparation method and use thereof, as well as photoresist developing solution | BOE TECHNOLOGY GROUP CO LTD | 2012-09-05 | — | — | CN | disclosed |
| CN-102656671-A | Method for manufacturing semiconductor transistor, driver circuit using semiconductor transistor manufactured by the method, pixel circuit including the driver circuit and display element, display panel in which the pixel circuits are arranged in rows and columns, and display device including the display panel | PANASONIC CORP | 2012-09-05 | — | — | CN | disclosed |
| CN-101356628-B | High throughput chemical mechanical polishing composition for metal film planarization | ADVANCED TECH MATERIALS | 2012-01-04 | — | — | CN | disclosed |
| CN-102282682-A | Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level | — | 2011-12-14 | — | — | CN | disclosed |
| CN-102169818-A | Improved method of texturing semiconductor substrates | OHM & HAAS ELECT MATERIALS | 2011-08-31 | — | — | CN | disclosed |
| CN-101884092-A | Method for cleaning substrate for semiconductor device and cleaning liquid | MITSUBISHI CHEM CORP | 2010-11-10 | — | — | CN | disclosed |
| CN-101842872-A | Compound for stripping photoresist | EKC TECHNOLOGY INC | 2010-09-22 | — | — | CN | disclosed |
| CN-1918698-B | Cleaning liquid and cleaning method for substrate for semiconductor device | MITSUBISHI CHEM CORP | 2010-04-07 | — | — | CN | disclosed |
| US-7601264-B2 | Method for treatment of plating solutions | APPLIED MATERIALS, INC. (US) | 2009-10-13 | — | — | US | disclosed |
| CN-101511607-A | Integrated chemical mechanical polishing composition and single platen processing method | ADVANCED TECH MATERIALS (US) | 2009-08-19 | — | — | CN | disclosed |
| CN-101371339-A | Chemical mechanical polishing composition for step II copper liners and other related materials and method of using same | ADVANCED TECH MATERIALS (US) | 2009-02-18 | — | — | CN | disclosed |
| CN-101356628-A | High throughput chemical mechanical polishing composition for metal film planarization | ADVANCED TECH MATERIALS (US) | 2009-01-28 | — | — | CN | disclosed |
| US-20080083623-A1 | METHOD AND APPARATUS FOR TREATMENT OF PLATING SOLUTIONS | APPLIED MATERIALS, INC. | 2008-04-10 | — | — | US | disclosed |
| US-20080083673-A1 | METHOD AND APPARATUS FOR TREATMENT OF PLATING SOLUTIONS | APPLIED MATERIALS, INC. | 2008-04-10 | — | — | US | disclosed |
| CN-1918698-A | Cleaning liquid and cleaning method for substrate for semiconductor device | MITSUBISHI CHEM CORP (JP) | 2007-02-21 | — | — | CN | disclosed |
| CN-1787895-A | Improved chemical mechanical polishing compositions for copper and associated materials and method of using same | ADVANCED TECH MATERIALS (US) | 2006-06-14 | — | — | CN | disclosed |
| CN-1610580-A | Esterification catalyst, polyester process and polyester article | ICI PLC (GB) | 2005-04-27 | — | — | CN | disclosed |
| CN-1107343-C | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness | MALLINCKRODT BAKER INC (US) | 2003-04-30 | — | — | CN | disclosed |
| CN-1187689-A | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness | MALLINCKRODT BAKER INC (US) | 1998-07-15 | — | — | CN | disclosed |
| CN-1187689-A | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness | MALLINCKRODT BAKER INC (US) | 1998-07-15 | — | — | CN | disclosed |