SCHEMBL424636

SCHEMBL424636

CCCC[Si](C)(C)OC(=O)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
FAAH O00519 12/20 0.39
EPHX1 P07099 1/20 0.39
CES1 P23141 10/20 0.38
CES2 O00748 7/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B10 Q99714 1/20 0.38
PLA2G6 O60733 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29368337 0.94 FAAH (0.42) FAAHEPHX1CES1CES2MEN1
SCHEMBL29368723 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL426579 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL29367386 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL29367353 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL11969311 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL426546 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL427969 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL29367413 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1
SCHEMBL29368054 0.93 EPHX1 (0.44) FAAHEPHX1CES1CES2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113169060-B Chamfering part treating agent composition and method for manufacturing wafer 中央硝子株式会社 2025-04-01 CN claimed
US-20250066621-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE CENTRAL GLASS COMPANY, LIMITED (JP) 2025-02-27 US claimed
EP-4459666-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE Central Glass Company, Limited (JP) 2024-11-06 EP claimed
CN-118451534-A Film-forming composition and method for producing substrate 中央硝子株式会社 2024-08-06 CN claimed
WO-2024143097-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD セントラル硝子株式会社 2024-07-04 WO claimed
CN-115699259-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-02-03 CN claimed
CN-115668459-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-01-31 CN claimed
US-20220020582-A1 BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER CENTRAL GLASS COMPANY, LIMITED (JP) 2022-01-20 US claimed
CN-113169060-A Chamfer treatment agent composition and method for producing wafer 中央硝子株式会社 2021-07-23 CN claimed
CN-110218160-A A kind of quinine acid derivative and the preparation method and application thereof 暨南大学 2019-09-10 CN claimed
US-9748092-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2017-08-29 US claimed
CN-107068540-A The cleaning method of chip 中央硝子株式会社 2017-08-18 CN claimed
US-20160148802-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS CO LTD (JP) 2016-05-26 US claimed
US-9228120-B2 Liquid chemical for forming protecting film CENTRAL GLASS COMPANY, LIMITED (JP) 2016-01-05 US claimed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
US-20120164818-A1 Process for Cleaning Wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2012-06-28 US claimed
US-20120017934-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-26 US claimed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20120017934-A1 Liquid Chemical for Forming Protecting Film CENTRAL GLASS COMPANY, LIMITED (JP) 2012-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220020582-A1 BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER SGMS1, SGMS2, SEM1 FAAH 2574/4885EPHX1 907/4885CES1 1119/4885
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD ESPL1, SMS, SGMS1 FAAH 4385/4885EPHX1 2321/4885CES1 1554/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.